Patents by Inventor Andrew Khoh

Andrew Khoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated circuit system with assist feature
    Patent number: 7836420
    Abstract: An integrated circuit system comprising: providing a substrate; forming a main feature using a first non-cross-junction assist feature over the substrate; forming the main feature using a second non-cross-junction assist feature, adjacent a location of the first non-cross-junction feature, over the substrate; and forming an integrated circuit having the substrate with the main feature thereover.
    Type: Grant
    Filed: October 22, 2007
    Date of Patent: November 16, 2010
    Assignee: Chartered Semiconductor Manufacturing Ltd.
    Inventors: Sia Kim Tan, Qunying Lin, Andrew Khoh
  • INTEGRATED CIRCUIT SYSTEM WITH ASSIST FEATURE
    Publication number: 20090102069
    Abstract: An integrated circuit system comprising: providing a substrate; forming a main feature using a first non-cross-junction assist feature over the substrate; forming the main feature using a second non-cross-junction assist feature, adjacent a location of the first non-cross-junction feature, over the substrate; and forming an integrated circuit having the substrate with the main feature thereover.
    Type: Application
    Filed: October 22, 2007
    Publication date: April 23, 2009
    Applicant: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
    Inventors: Sia Kim Tan, Qunying Lin, Andrew Khoh
  • System and method for designing semiconductor photomasks
    Patent number: 7313780
    Abstract: A trial semiconductor photomask design having discontinuity points is provided, and each of the discontinuity points is treated as simulated light sources. Simulated light from each of the simulated light sources is focused, and a composite image intensity of the focused simulated light is calculated to verify the trial semiconductor photomask design. The trial semiconductor photomask design is sharpened. A photomask design specification is generated for use in fabricating such a photomask.
    Type: Grant
    Filed: March 10, 2005
    Date of Patent: December 25, 2007
    Assignee: Chartered Semiconductor Manufacturing Ltd.
    Inventors: Andrew Khoh, Byong-Il Choi, Lap Chan, Ganesh Samudra, Yihong Wu
  • System and method for designing semiconductor photomasks
    Publication number: 20060206852
    Abstract: A trial semiconductor photomask design having discontinuity points is provided, and each of the discontinuity points is treated as simulated light sources. Simulated light from each of the simulated light sources is focused, and a composite image intensity of the focused simulated light is calculated to verify the trial semiconductor photomask design. The trial semiconductor photomask design is sharpened. A photomask design specification is generated for use in fabricating such a photomask.
    Type: Application
    Filed: March 10, 2005
    Publication date: September 14, 2006
    Applicant: Chartered Semiconductor Manufacturing, Ltd.
    Inventors: Andrew Khoh, Byong-Il Choi, Lap Chan, Ganesh Samudra, Yihong Wu