Patents by Inventor Andrew L. Nordquist

Andrew L. Nordquist has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for controlling plasma uniformity across a substrate
    Patent number: 6497796
    Abstract: A magnetron source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, and good process uniformity. Step coverage uniformity is also improved by controlling the magnetic fields, and thus the flow of ions and electrons, near the plane of the substrate.
    Type: Grant
    Filed: August 31, 2000
    Date of Patent: December 24, 2002
    Assignee: Novellus Systems, Inc.
    Inventors: Kaihan A. Ashtiani, Karl B. Levy, Kwok F. Lai, Andrew L. Nordquist, Larry D. Hartsough
  • Physical vapor deposition reactor including magnet to control flow of ions
    Patent number: 6444105
    Abstract: A novel hollow cathode magnetron source is disclosed. The source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, and good process uniformity.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: September 3, 2002
    Assignee: Novellus Systems, Inc.
    Inventors: Kwok F. Lai, Andrew L. Nordquist, Kaihan A. Ashtiani, Larry D. Hartsough, Karl B. Levy
  • Apparatus and method for controlling erosion profile in hollow cathode magnetron sputter source
    Patent number: 6193854
    Abstract: A hollow cathode magnetron (HCM) sputter source includes a main magnet positioned near the sidewall of the hollow cathode target and a pair of rotating magnet arrays that are positioned near the closed end of the hollow cathode target. One of the arrays produces a magnetic field that is aligned with (aids) the magnetic field produced by the main magnet; the other arrays produce a magnetic field that is aligned against (bucks) the magnetic field produced by the main magnet. Field lines produced by the magnet arrays contain an extension of the plasma that is controlled by the main magnet. Charged particles circulate between the two portions of the plasma. The extended plasma is thus formed over a very high percentage of the surface of the target, thereby creating an erosion profile that is highly uniform and encompasses essentially the entire face of the target. This maximizes the utilization of the target and minimizes the frequency at which the spent target must be replaced.
    Type: Grant
    Filed: August 16, 1999
    Date of Patent: February 27, 2001
    Assignee: Novellus Systems, Inc.
    Inventors: Kwok Fai Lai, Larry Dowd Hartsough, Andrew L. Nordquist, Kaihan Abidi Ashtiani, Karl B. Levy, Maximilian A. Biberger
  • Apparatus and method for controlling plasma uniformity across a substrate
    Patent number: 6179973
    Abstract: A novel hollow cathode magnetron source is disclosed. The source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, and good process uniformity.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: January 30, 2001
    Assignee: Novellus Systems, Inc.
    Inventors: Kwok F. Lai, Andrew L. Nordquist, Kaihan A. Ashtiani, Larry D. Hartsough, Karl B. Levy
  • Triple-pane waveguide window
    Patent number: 4688009
    Abstract: A waveguide window contains a central transverse pane of a material with high dielectric constant such as alumina ceramic. The central pane is an integral number of half-wavelengths thick. On each side of the central pane and immediately adjacent it is a side pane of material with relatively low dielectric constant such as fused quartz. The side panes are odd numbers of quarter-wavelengths thick. The dielectric constants of the side panes are preferably the square root of the dielectric constant of the central pane. The improved wave impedance matching provides a low wave reflection over a wide frequency band.
    Type: Grant
    Filed: May 13, 1985
    Date of Patent: August 18, 1987
    Assignee: Varian Associates, Inc.
    Inventors: Patrick E. Ferguson, Andrew L. Nordquist