Patents by Inventor Andrew Mayne

Andrew Mayne has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220296468
    Abstract: A pharmaceutical dosage system includes a blister pack and a plurality of dosage forms contained by the blister pack. The dosage forms are to be consumed in an up-titration process. Only one single dosage form of the plurality of dosage forms is consumed on a given day throughout the up-titration process whereby dosages increase over the course of a multi-day period of time.
    Type: Application
    Filed: March 17, 2022
    Publication date: September 22, 2022
    Inventors: Andrew Mayne, Petra Lutz, Paromita Sarkar, Galina Gouvea
  • Publication number: 20070259721
    Abstract: A steering assembly has a yoke and an axially compliant intermediate shaft having an elastomeric coupling fitted concentrically to the yoke for rotation about an axis. Preferably, a rigid sleeve of the shaft has a cylindrical portion that fixes concentrically to an end portion of a shaft element that extends longitudinally along the axis. Two diametrically opposite tabs of the sleeve project radially outward from the cylindrical portion. A resiliently flexible isolator is preferably molded to the sleeve and circumferentially covers the tabs and the cylindrical portion. The isolator preferably has two diametrically opposite ears located circumferentially between two diametrically opposite cover segments that substantially cover the tabs. The tabs generally prevent rotation of the shaft with respect to the yoke in case of isolator failure due to the excessive torque. Each ear preferably has a lobe that projects axially beyond the sleeve for enhancing axial compliancy of the intermediate shaft.
    Type: Application
    Filed: April 26, 2007
    Publication date: November 8, 2007
    Inventors: Kristina C. Scrimpsher, Troy Daenzer, Gary A. Novotny, Rogelio I. Macias Perez, Ernesto Torres, Andrew Maynes
  • Patent number: 6924509
    Abstract: Monoatomic and monocrystalline layer of large size, in diamond type carbon, and method for the manufacture of this layer. According to the invention, a monocrystalline substrate (2) is formed in SiC terminated by an atomic plane of carbon according to a reconstruction c(2×2) and at least one annealing is carried out, capable of transforming this atomic plane, which is a plane of dimers C?C (4) of sp configuration, into a plane of dimers C—C (8) of sp3 configuration. Application to microelectronics, optics, optoelectronics, micromechanics and biomaterials.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: August 2, 2005
    Assignees: Commissariat a l'Energie Atomique, Centre National de la Recherche Scientifique
    Inventors: Vincent Derycke, Gérald Dujardin, Andrew Mayne, Patrick Soukiassian
  • Publication number: 20050035380
    Abstract: Monoatomic and monocrystalline layer of large size, in diamond type carbon, and method for the manufacture of this layer. According to the invention, a monocrystalline substrate (2) is formed in SiC terminated by an atomic plane of carbon according to a reconstruction c(2x2) and at least one annealing is carried out, capable of transforming this atomic plane, which is a plane of dimers C?C (4) of sp configuration, into a plane of dimers C-C (8) of sp3 configuration. Application to microelectronics, optics, optoelectronics, micromechanics and biomaterials.
    Type: Application
    Filed: September 23, 2004
    Publication date: February 17, 2005
    Inventors: Vincent Derycke, Gerald Dujardin, Andrew Mayne, Patrick Soukiassian
  • Patent number: 6667102
    Abstract: A highly oxygen-sensitive silicon layer (2) is formed on a substrate (4) of, for example, SiC. The layer (2) has a 4×3 surface structure. The silicon layer (2) is deposited on a surface of the substrate (4) in a substantially uniform manner. The highly oxygen-sensitive silicon layer of the present invention may be used, for example in microelectronics.
    Type: Grant
    Filed: May 24, 2002
    Date of Patent: December 23, 2003
    Assignee: Commissariat A l'Energie Atomique
    Inventors: Fabrice Amy, Christian Brylinski, Gérald Dujardin, Hanna Enriquez, Andrew Mayne, Patrick Soukiassian
  • Patent number: 6274234
    Abstract: Atomic wires of great length and great stability are formed on the surface of a SiC substrate as straight chains of dimers of an element chosen from amongst SiC and C. In order to produce same, layers of the element are formed on the surface and the assembly is constructed by means of annealings of the surface provided with the layers. The resulting wires have application to nanoelectronics.
    Type: Grant
    Filed: June 14, 1999
    Date of Patent: August 14, 2001
    Assignees: Commissariat a l'Energie Atomique, Centre National de la Recherche Scientifique
    Inventors: Gérald Dujardin, Andrew Mayne, Fabrice Semond, Patrick Soukiassian