Abstract: According to one embodiment, a system includes an event processing module, a notification controller, and a publication manager. The event processing module includes listeners configured to generate a snapshot of a database. The event processing module also includes an event processor configured to compare the snapshot with a stored historical snapshot to determine data elements in the database that changed, to generate a message indicating the plurality of changes, and to push the message to a queue. The notification controller is configured to receive the message from the queue, to determine, based on stored publication rules, a change from the plurality of changes that should be published, and to format the change based on stored format rules. The publication manager is configured to receive the formatted change, to determine, based on stored subscriptions, whether the formatted change should be communicated to a client, and to communicate the change.

Abstract: According to one embodiment, a system includes an event processing module, a notification controller, and a publication manager. The event processing module includes listeners configured to generate a snapshot of a database. The event processing module also includes an event processor configured to compare the snapshot with a stored historical snapshot to determine data elements in the database that changed, to generate a message indicating the plurality of changes, and to push the message to a queue. The notification controller is configured to receive the message from the queue, to determine, based on stored publication rules, a change from the plurality of changes that should be published, and to format the change based on stored format rules. The publication manager is configured to receive the formatted change, to determine, based on stored subscriptions, whether the formatted change should be communicated to a client, and to communicate the change.

Abstract: An apparatus for introducing gas into a large body of liquid, including a horizontal frame on ballast adjustable floats, a pressurized gas source, a vertical shaft rotatable about its axis, and a plurality of blades submerged in the liquid and extending radially from a hub on the lower end of the shaft. The blades each have an elastomeric membrane around a longitudinal member, where the longitudinal member is hollow with a closed end and in communication with the pressurized gas source through the shaft on the other end, with openings through its lower side, and the elastomeric membrane has perforations which are spaced from the longitudinal member openings. A drive on the platform rotates the shaft via a ring gear around the shaft with a key connection thereto allowing axial movement therethrough, and an inwardly facing surface supported on bearings. A selectively driven and smaller pinion gear directly engages the ring gear.

Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.

Abstract: An assist mechanism for assisting in the pivotal movement of an enclosure member between closed, intermediate, and open positions. A first biasing member has a swing arm pivotally connected to a strut and extends between a base plate and enclosure member, and a second biasing member has a link pivotally connected to a limited tension spring and also extends between the base plate and enclosure member, whereby each impart a substantially biasing force substantially on only one side of the intermediate position, with the first biasing member biasing the enclosure member away from the closed position, and a second biasing member biasing the enclosure member away from the open position.

Abstract: A system and a method for providing telephone call message translation via a relay center having a message translator for translating messages between parties of a telephone call from text to speech and from speech to text, as required. A communication link is provided between at least a first party of a number of parties of the telephone call and the message translator via one of an Internet Protocol connection or a network connection.

Abstract: A system and a method for providing Internet-based telephone call message translation for translating messages between parties of a telephone call from text to speech and from speech to text, as required. A server having communication capability over an Internet Protocol connection is provided. At least one message translator having communication capability over an Internet Protocol connection is also provided. A communication link through the server is provided between at least a first party of a number of parties of a telephone call and the message translator via an Internet Protocol connection.

Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.

Abstract: An illumination system having an array optical element with different illumination regions corresponding or matched to different line width variations printed on a photosensitive material. The array optical element may be a filter, diffractive optical element, or micro lens array having illumination regions producing different types of illumination properties or characteristics. Each of the illumination regions are matched or correspond to a respective region on a patterning device to provide optimized exposure of a photosensitive material. The optical element may be used to tailor a conventional illumination system to the unique characteristics of the projection optics used in a system, thereby compensating for vertical and horizontal bias or variations in line width for features oriented in the vertical and horizontal direction.

Abstract: A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used.

Abstract: A reticle or mask for use in projecting a circuit pattern, having a transparent substrate with a reflective or dielectric layer thereon. An opaque or blocking layer is placed over the reflective layer. The opaque layer then has a predetermined circuit pattern etched therein. In one embodiment, the opaque layer and the reflective layer are the same size. In another embodiment, the opaque layer has a size larger than the reflective layer. This permits the opaque layer to be adjacent the substrate, which is advantageous when projection optics having a high numerical aperture are used. The reticle of the present invention has particular advantage when using source wavelengths of between 157 nanometers and 365 nanometers. The reflective layer or land has a reflectance greater than chrome, and preferably greater than sixty percent. Therefore, the reflective layer greatly reduces reticle warm-up and thermal distortion.