Patents by Inventor Andrew McNees
Andrew McNees has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10647119Abstract: Disclosed is a method for fabricating a fluid ejection device. The method includes forming a drive circuitry layer on a substrate. The method further includes fabricating at least one fluid ejection element on the substrate. Furthermore, the method includes forming at least one slot within a top portion of the substrate, and forming at least one fluid feed trench within a bottom portion of the substrate. Each fluid feed trench of the at least one fluid feed trench is in fluid communication with one or more slots of the at least one slot. Additionally, the method includes laminating a flow feature layer and a nozzle plate over the substrate having the at least one slot and the at least one fluid feed trench formed therewithin. Further disclosed is a fluid ejection device fabricated using the aforementioned method.Type: GrantFiled: September 24, 2018Date of Patent: May 12, 2020Assignee: Funai Electric Co., Ltd.Inventors: David Bernard, Andrew McNees, James Mrvos
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Publication number: 20190030889Abstract: Disclosed is a method for fabricating a fluid ejection device. The method includes forming a drive circuitry layer on a substrate. The method further includes fabricating at least one fluid ejection element on the substrate. Furthermore, the method includes forming at least one slot within a top portion of the substrate, and forming at least one fluid feed trench within a bottom portion of the substrate. Each fluid feed trench of the at least one fluid feed trench is in fluid communication with one or more slots of the at least one slot. Additionally, the method includes laminating a flow feature layer and a nozzle plate over the substrate having the at least one slot and the at least one fluid feed trench formed therewithin. Further disclosed is a fluid ejection device fabricated using the aforementioned method.Type: ApplicationFiled: September 24, 2018Publication date: January 31, 2019Inventors: David BERNARD, Andrew MCNEES, James MRVOS
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Patent number: 10112404Abstract: A fluidic ejection cartridge is disclosed. The cartridge includes a cartridge body having an upper portion, a lower portion, at least one sidewall, and a hollow cavity within the cartridge body defining a fluid reservoir. The cartridge also includes a cartridge lid disposed over and sealed to the upper portion of the cartridge body, as well as a cartridge bottom plate disposed under and sealed to the lower portion of the cartridge body. A cartridge nosepiece is disposed under and sealed to the cartridge bottom plate. This nosepiece includes at least one fluidic ejection chip in fluid flow communication with the fluid reservoir. According to the present disclosure, the cartridge body, the cartridge lid, and the cartridge bottom are each made from ceramic.Type: GrantFiled: November 3, 2016Date of Patent: October 30, 2018Assignee: Funai Electric Co., Ltd.Inventors: Sean Weaver, Andrew McNees
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Publication number: 20180117921Abstract: A fluidic ejection cartridge is disclosed. The cartridge includes a cartridge body having an upper portion, a lower portion, at least one sidewall, and a hollow cavity within the cartridge body defining a fluid reservoir. The cartridge also includes a cartridge lid disposed over and sealed to the upper portion of the cartridge body, as well as a cartridge bottom plate disposed under and sealed to the lower portion of the cartridge body. A cartridge nosepiece is disposed under and sealed to the cartridge bottom plate. This nosepiece includes at least one fluidic ejection chip in fluid flow communication with the fluid reservoir. According to the present disclosure, the cartridge body, the cartridge lid, and the cartridge bottom are each made from ceramic.Type: ApplicationFiled: November 3, 2016Publication date: May 3, 2018Applicant: Funai Electric Co., Ltd.Inventors: Sean Weaver, Andrew McNees
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Patent number: 9878894Abstract: A fluidic delivery device includes a fluid supply containing a fluid, the fluid supply has a fluid reservoir and a pair of fluid permeable compressible bodies located in the fluid reservoir. One of the fluid permeable compressible bodies has an effective greater density than the other fluid permeable compressible body.Type: GrantFiled: July 8, 2016Date of Patent: January 30, 2018Assignee: Funai Electric Co., Ltd.Inventors: James D. Anderson, Jr., Tim Frasure, Sean Weaver, David Bernard, David Graham, Andrew McNees
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Publication number: 20180009649Abstract: A fluidic delivery device includes a fluid supply containing a fluid, the fluid supply has a fluid reservoir and a pair of fluid permeable compressible bodies located in the fluid reservoir. One of the fluid permeable compressible bodies has an effective greater density than the other fluid permeable compressible body.Type: ApplicationFiled: July 8, 2016Publication date: January 11, 2018Inventors: James D. Anderson, JR., Tim Frasure, Sean Weaver, David Bernard, David Graham, Andrew McNees
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Publication number: 20160325546Abstract: Disclosed is a method for fabricating a fluid ejection device. The method includes forming a drive circuitry layer on a substrate. The method further includes fabricating at least one fluid ejection element on the substrate. Furthermore, the method includes forming at least one slot within a top portion of the substrate, and forming at least one fluid feed trench within a bottom portion of the substrate. Each fluid feed trench of the at least one fluid feed trench is in fluid communication with one or more slots of the at least one slot. Additionally, the method includes laminating a flow feature layer and a nozzle plate over the substrate having the at least one slot and the at least one fluid feed trench formed therewithin. Further disclosed is a fluid ejection device fabricated using the aforementioned method.Type: ApplicationFiled: July 15, 2016Publication date: November 10, 2016Inventors: DAVID BERNARD, ANDREW MCNEES, JAMES MRVOS
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Patent number: 9403365Abstract: A method for fabricating a fluid ejection device includes forming a drive circuitry layer on a substrate, fabricating at least one fluid ejection element on a top portion of the substrate, grinding the substrate from a bottom portion of the substrate up to a predetermined height, etching the top portion of the substrate to configure at least one slot within the top portion of the substrate, depositing a layer of an etch-stop material over the top portion of the substrate while filling the at least one slot with the etch-stop material, etching the bottom portion of the substrate to configure at least one fluid feed trench within the bottom portion of the substrate, removing the layer of the etch-stop material from the top portion of the substrate, and laminating a flow feature layer and a nozzle plate as a single unit over the top portion of the substrate.Type: GrantFiled: April 29, 2011Date of Patent: August 2, 2016Assignee: FUNAI ELECTRIC CO., LTD.Inventors: David Bernard, Andrew Mcnees, James Mrvos
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Publication number: 20150283810Abstract: Disclosed is a fluid ejection device for an inkjet printer that includes a substrate. The substrate includes at least one trench and a plurality of fluid flow vias configured in at least three parallel rows arranged over each trench of the at least one trench. Each row of the at least three parallel rows includes a set of fluid flow vias from the plurality of fluid flow vias arranged in one of a uniform manner and a non-uniform manner such that each fluid flow via of the set of fluid flow vias is configured in a spaced-apart relation with an adjacent fluid flow via. The each fluid flow via is configured in a diagonal relationship relative to a neighboring fluid flow via of an adjacent row of the at least three parallel rows. The fluid ejection device also includes a flow feature layer and a nozzle plate.Type: ApplicationFiled: June 19, 2015Publication date: October 8, 2015Inventors: Jiandong FANG, Paul GRAF, Andrew MCNEES
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Patent number: 9132639Abstract: A method for fabricating an ejection chip of a fluid ejection device includes forming a drive circuitry layer on a substrate, fabricating at least one fluid ejection element on the substrate, forming at least one slot within a top portion of the substrate, filling each slot of the at least one slot with a protective material, grinding the substrate from a bottom portion of the substrate up to a predetermined height, removing the protective material from the each slot of the at least one slot, and laminating a flow feature layer and a nozzle plate over the substrate having the at least one slot.Type: GrantFiled: April 29, 2011Date of Patent: September 15, 2015Assignee: Funai Electric Co., Ltd.Inventors: David Bernard, Andrew McNees, James Mrvos
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Patent number: 9079409Abstract: Disclosed is a fluid ejection device for an inkjet printer that includes a substrate. The substrate includes at least one trench and a plurality of fluid flow vias configured in at least three parallel rows arranged over each trench of the at least one trench. Each row of the at least three parallel rows includes a set of fluid flow vias from the plurality of fluid flow vias arranged in one of a uniform manner and a non-uniform manner such that each fluid flow via of the set of fluid flow vias is configured in a spaced-apart relation with an adjacent fluid flow via. The each fluid flow via is configured in a diagonal relationship relative to a neighboring fluid flow via of an adjacent row of the at least three parallel rows. The fluid ejection device also includes a flow feature layer and a nozzle plate.Type: GrantFiled: June 30, 2011Date of Patent: July 14, 2015Inventors: Jiandong Fang, Paul Graf, Andrew McNees
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Publication number: 20130002771Abstract: Disclosed is a fluid ejection device for an inkjet printer that includes a substrate. The substrate includes at least one trench and a plurality of fluid flow vias configured in at least three parallel rows arranged over each trench of the at least one trench. Each row of the at least three parallel rows includes a set of fluid flow vias from the plurality of fluid flow vias arranged in one of a uniform manner and a non-uniform manner such that each fluid flow via of the set of fluid flow vias is configured in a spaced-apart relation with an adjacent fluid flow via. The each fluid flow via is configured in a diagonal relationship relative to a neighboring fluid flow via of an adjacent row of the at least three parallel rows. The fluid ejection device also includes a flow feature layer and a nozzle plate.Type: ApplicationFiled: June 30, 2011Publication date: January 3, 2013Inventors: Jiandong Fang, Paul Graf, Andrew Mcnees
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Publication number: 20120273597Abstract: Disclosed is a method for fabricating a fluid ejection device. The method includes forming a drive circuitry layer on a substrate. The method further includes fabricating at least one fluid ejection element on the substrate. Furthermore, the method includes forming at least one slot within a top portion of the substrate, and forming at least one fluid feed trench within a bottom portion of the substrate. Each fluid feed trench of the at least one fluid feed trench is in fluid communication with one or more slots of the at least one slot. Additionally, the method includes laminating a flow feature layer and a nozzle plate over the substrate having the at least one slot and the at least one fluid feed trench formed therewithin. Further disclosed is a fluid ejection device fabricated using the aforementioned to method.Type: ApplicationFiled: April 29, 2011Publication date: November 1, 2012Inventors: DAVID BERNARD, ANDREW MCNEES, JAMES MRVOS
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Publication number: 20120273594Abstract: Disclosed is a method for fabricating a fluid ejection device that includes forming a drive circuitry layer on a substrate and fabricating at least one fluid ejection element on the substrate. Furthermore, the method includes forming at least one slot within a top portion of the substrate, and filling each slot of the at least one slot with a protective material. Additionally, the method includes grinding the substrate from a bottom portion thereof. Moreover, the method includes removing the protective material from the each slot. Further, the method includes depositing a layer of a polymeric bonding material on a bottom surface of the substrate. Furthermore, the method includes attaching a manifold chip to the layer of the polymeric bonding material. The method also includes laminating a flow feature layer and a nozzle plate over the substrate. Further disclosed are an ejection chip and a method for fabricating the ejection chip.Type: ApplicationFiled: April 29, 2011Publication date: November 1, 2012Inventors: DAVID BERNARD, ANDREW MCNEES, JAMES MRVOS
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Publication number: 20070257006Abstract: A method of micro-machining a semiconductor substrate to form one or more through slots therein. The semiconductor substrate has a device side and a fluid side opposite the device side. The method includes diffusing a p-type doping material into the device side of the semiconductor substrate in one or more through slot locations to be etched through a thickness of the substrates. The semiconductor substrate is then etched with a dry etch process from the device side of the substrate to the fluid side of the substrate so that one or more through slots having a reentrant profile are formed in the substrate.Type: ApplicationFiled: July 17, 2007Publication date: November 8, 2007Inventors: David BERNARD, John Krawczyk, Andrew McNees
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Publication number: 20070000863Abstract: A method of micro-machining a semiconductor substrate to form one or more through slots therein. The semiconductor substrate has a device side and a fluid side opposite the device side. The method includes diffusing a p-type doping material into the device side of the semiconductor substrate in one or more through slot locations to be etched through a thickness of the substrate. The semiconductor substrate is then etched with a dry etch process from the device side of the substrate to the fluid side of the substrate so that one or more through slots having a reentrant profile are formed in the substrate.Type: ApplicationFiled: June 30, 2005Publication date: January 4, 2007Inventors: David Bernard, John Krawczyk, Andrew McNees
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Publication number: 20060189144Abstract: A process for etching semiconductor substrates using a deep reactive ion etching process to produce through holes or slots (hereinafter “slots”) in the substrates. The process includes applying a first layer to a back side of a substrate as a first etch stop material. The first layer is a relatively soft etch stop material. A second layer is applied to the first layer on the back side of the substrate to provide a composite etch stop layer. The second layer is a relatively hard etch stop material. The substrate is etched from a side opposite the back side of the substrate to provide a slot in the substrate.Type: ApplicationFiled: February 22, 2005Publication date: August 24, 2006Inventors: John Krawczyk, Andrew McNees, Christopher Money, Girish Patil, David Rhine, Karthik Vaideeswaran
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Publication number: 20060115921Abstract: Methods of micro-machining a semiconductor substrate to form through fluid feed slots therein. One method includes providing a semiconductor substrate wafer having a thickness greater than about 500 microns and having a device side and a back side opposite the device side. The back side of the wafer is mechanically ground to provide a wafer having a thickness ranging from about 100 up to about 500 microns. Dry etching is conducted on the wafer from a device side thereof to form a plurality of reentrant fluid feed slots in the wafer from the device side to the back side of the wafer.Type: ApplicationFiled: December 1, 2004Publication date: June 1, 2006Inventors: John Krawczyk, Andrew McNees, Richard Warner
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Publication number: 20060113277Abstract: A method of micro-machining a semiconductor substrate to form through slots therein and substrates made by the method. The method includes providing a dry etching chamber having a platen for holding a semiconductor substrate. During an etching cycle of a dry etch process for the semiconductor substrate, a source power is decreased, a chamber pressure is decreased from a first pressure to a second pressure, and a platen power is increased from a first power to a second power. Through slots in the substrate provided by the method can have a reentrant profile for fluid flow therethrough.Type: ApplicationFiled: December 1, 2004Publication date: June 1, 2006Inventors: John Krawczyk, Andrew McNees, Richard Warner
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Publication number: 20060077221Abstract: A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.Type: ApplicationFiled: November 17, 2005Publication date: April 13, 2006Inventors: Karthik Vaideeswaran, Andrew McNees, John Krawczyk, James Mrvos, Cory Hammond, Mark Doerre, Jason Vanderpool, Girish Patil, Christopher Money, Gary Williams, Richard Warner