Abstract: Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (I) wherein each instance of R4, R5, R6, R7, R8, R10, R11, R12, R13, and R14 is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, alkoxyl, aryloxyl, ether, and heterocyclyl. Each instance of R9 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and ether. Each instance of R28 and R29 of Formula (I) is independently selected from the group consisting of hydrogen, alkyl, and aryl. Each instance of R33 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R41 of Formula (I) is independently —NH— or a bond and each instance of R40 is independently —NH— or —NH—NH—.

Abstract: The present disclosure relates to a cold spray metal process for providing an electrical connection within a multilayered composite article. The present disclosure relates to a cold sprayed metal coated article or a structural component having a polymeric composite material having at least one surface, a thermoplastic electrochemical insulating layer on the at least one surface, an electrical circuit may include a cold sprayed metal coating present on at least a portion of a surface of the electrochemical insulating layer, and at least one additional layer, the at least one additional layer encapsulating at least a portion of the cold sprayed metal between the additional layer and the electrochemical insulating layer. The structural component may include a cold sprayed metal coating having one or more non-continuous segments, where the one or more non-continuous segments are not in lateral contact with one another.

Abstract: Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (IV) wherein each instance of R9 is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heteroaryl, and ether. Each instance of R28 and R29 of Formula (IV) is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, and aryl. Each instance of R33 of Formula (IV) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R41 of Formula (IV) is independently —NH— or a bond and each instance of R40 is independently —NH— or —NH—NH—. Each instance of R42 of Formula (IV) is independently —NH— or a bond and each instance of R43 is independently —NH— or —NH—NH—.

Abstract: Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (I) wherein each instance of R4, R5, R6, R7, R8, R10, R11, R12, R13, and R14 is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, alkoxyl, aryloxyl, ether, and heterocyclyl. Each instance of R9 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and ether. Each instance of R28 and R29 of Formula (I) is independently selected from the group consisting of hydrogen, alkyl, and aryl. Each instance of R33 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R41 of Formula (I) is independently —NH— or a bond and each instance of R40 is independently —NH— or —NH—NH—.

Abstract: Methods for cleaning surfaces are provided. Such a method may comprise contacting a surface with a fluid comprising a compound of Formula I for a period of time; and removing the fluid from the surface, thereby providing a cleaned surface. Vapor phase degreasing systems for cleaning a surface of a component are also provided. Such a system may comprise a boil sump comprising liquid comprising a compound of Formula I; and a holder configured to hold a component in a vapor formed from the liquid.

Abstract: Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (IV) wherein each instance of R9 is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heteroaryl, and ether. Each instance of R28 and R29 of Formula (IV) is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, and aryl. Each instance of R33 of Formula (IV) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R41 of Formula (IV) is independently —NH— or a bond and each instance of R40 is independently —NH— or —NH—NH—. Each instance of R42 of Formula (IV) is independently —NH— or a bond and each instance of R43 is independently —NH— or —NH—NH—.

Abstract: Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (I) wherein each instance of R4, R5, R6, R7, R8, R10, R11, R12, R13, and R14 is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, alkoxyl, aryloxyl, ether, and heterocyclyl. Each instance of R9 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and ether. Each instance of R28 and R29 of Formula (I) is independently selected from the group consisting of hydrogen, alkyl, and aryl. Each instance of R33 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R41 of Formula (I) is independently —NH— or a bond and each instance of R40 is independently —NH— or —NH—NH—.

Abstract: Methods for cleaning surfaces are provided. Such a method may comprise contacting a surface with a fluid comprising a compound of Formula I for a period of time; and removing the fluid from the surface, thereby providing a cleaned surface. Vapor phase degreasing systems for cleaning a surface of a component are also provided. Such a system may comprise a boil sump comprising liquid comprising a compound of Formula I; and a holder configured to hold a component in a vapor formed from the liquid.

Abstract: Coating compositions that may be used in combination with UV light for sterilization include a polyurethane component and nanoparticles having an average particle size of from about 30 nm to about 400 nm. The nanoparticles absorb light having a wavelength of from about 100 nm to about 290 nm, and are present in an amount of less than about 25 weight percent of total solids in the coating composition.