Patents by Inventor Andrew N. Dasheff

Andrew N. Dasheff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4886734
    Abstract: An insoluble electron beam positive polyimide having the formula ##STR1## can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device.
    Type: Grant
    Filed: September 26, 1988
    Date of Patent: December 12, 1989
    Assignees: Rensselaer Polytechnic Institute, International Business Machines Corporation
    Inventors: James A. Moore, Andrew N. Dasheff, Frank B. Kaufman
  • Patent number: 4877718
    Abstract: An insoluble photosensitive polyimide having the formula ##STR1## can be exposed by a pattern of light to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device. A process for preparing the photosensitive soluble polyimide utilizes maleic anhydride which is irradiated by ultraviolet light to form a cyclobutane unit which is reacted with oxydianiline to form polymic acid. The polymic acid is cured using heat into the photosensitive soluble polyimide.
    Type: Grant
    Filed: September 26, 1988
    Date of Patent: October 31, 1989
    Assignees: Rennsselaer Polytechnic Institute, International Business Machines Corporation
    Inventors: James A. Moore, Andrew N. Dasheff, Frank B. Kaufman