Patents by Inventor Andrew P. Ryan

Andrew P. Ryan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma reactor and process with wafer temperature control
    Patent number: 5016332
    Abstract: Gas plasma system and process which are particularly suitable for photoresist stripping and descumming operations. A wafer is placed on a heated platen in a processing chamber and is lifted away from the platen to control thermal contact between the wafer and the platen. The front side of the wafer is also heated with radiant heat energy, and the temperature of the platen is adjusted to control the temperature of the wafer. In the disclosed embodiments, a gas plasma is generated outside the processing chamber and introduced into the chamber through a gas distribution plate which is also transparent to the radiant heat energy.
    Type: Grant
    Filed: April 13, 1990
    Date of Patent: May 21, 1991
    Assignee: Branson International Plasma Corporation
    Inventors: Richard F. Reichelderfer, deceased, Janice I. McOmber, Andrew P. Ryan, John T. Davies