Abstract: A pedestal assembly for a substrate processing system configured to perform bulk deposition on a substrate is configured to be raised and lowered. The pedestal assembly includes a stem portion, a baseplate portion disposed on the stem portion, and a pumping ring assembly. The baseplate portion is configured to support the substrate. The pumping ring assembly is disposed around the baseplate portion and includes a lower pumping ring and an upper pumping ring disposed above the lower pumping ring. The pumping ring assembly is configured to define an annular volume radially outside of the pumping ring assembly such that the pumping ring assembly separates the annular volume from a volume defined below the baseplate portion of the pedestal assembly.

Abstract: Examples are disclosed that relate to a purge plate comprising a shroud. The shroud helps to avoid crosstalk between stations in a multi-station processing chamber. One example provides a processing tool comprising a processing chamber comprising a plurality of stations. The processing tool also comprises a purge plate comprising a chamber-facing surface. The purge plate further comprises a plurality of cutouts configured to accommodate process gas outlets of the plurality of stations. The purge plate further comprises a shroud arranged around at least a portion of a perimeter of a first cutout of a plurality of cutout. The shroud extends away from the chamber-facing surface. The purge plate further comprises a plurality of purge gas holes formed in the chamber-facing surface and the shroud.

Abstract: A cleaning apparatus for a vacuum pedestal and method of cleaning a pedestal used in semiconductor device fabrication are described. The apparatus has a baseplate, a collar attached to the baseplate, a cap disposed on the collar, and a shaft that extends from the collar through the cap, collar and baseplate. A manual rotatable handle is attached to a shaft portion that extends from the cap. Motion of the handle in a downward direction is impeded by the cap. A disk is attached to a lower portion of the shaft and is separated from a bottom of the baseplate due to weighted rings, which are attached to the disk and surround the lower portion of the shaft such that a vertical float is present between the shaft and the cap. At least one abrasive pad is attached to the disk to remove build-up on the underlying pedestal surface.

Abstract: A cleaning apparatus for a vacuum pedestal and method of cleaning a pedestal used in semiconductor device fabrication are described. The apparatus has a baseplate, a collar attached to the baseplate, a cap disposed on the collar, and a shaft that extends from the collar through the cap, collar and baseplate. A manual rotatable handle is attached to a shaft portion that extends from the cap. Motion of the handle in a downward direction is impeded by the cap. A disk is attached to a lower portion of the shaft and is separated from a bottom of the baseplate due to weighted rings, which are attached to the disk and surround the lower portion of the shaft such that a vertical float is present between the shaft and the cap. At least one abrasive pad is attached to the disk to remove build-up on the underlying pedestal surface.

Abstract: A system to align a shadow ring on a substrate support includes a baseplate of the substrate support, an alignment recess defined within an upper surface of the baseplate, a shadow ring, an upper alignment groove defined in a lower surface of the shadow ring, an alignment block disposed within the alignment recess, and an alignment feature disposed between the shadow ring and the alignment block. The alignment feature extends into the upper alignment groove defined in the lower surface of the shadow ring.

Abstract: A cleaning apparatus for a vacuum pedestal and method of cleaning a pedestal used in semiconductor device fabrication are described. The apparatus has a baseplate, a collar attached to the baseplate, a cap disposed on the collar, and a shaft that extends from the collar through the cap, collar and baseplate. A manual rotatable handle is attached to a shaft portion that extends from the cap. Motion of the handle in a downward direction is impeded by the cap. A disk is attached to a lower portion of the shaft and is separated from a bottom of the baseplate due to weighted rings, which are attached to the disk and surround the lower portion of the shaft such that a vertical float is present between the shaft and the cap. At least one abrasive pad is attached to the disk to remove build-up on the underlying pedestal surface.