Abstract: Method of delignification of plant material, said method comprising: providing said plant material comprising cellulose fibres and lignin; exposing said plant material requiring to a composition comprising: an acid; a modifying agent selected from the group consisting of: sulfamic acid; imidazole; N-alkylimidazole derivative; taurine; a taurine derivative; a taurine-related compound; alkylsulfonic acid; arylsulfonic acid; triethanolamine; and combinations thereof; a metal oxide; and a peroxide; adding an organic solvent to the resulting mixture; allowing a delignification reaction to occur for a period of time sufficient to remove at least 80% of the lignin present on said plant material.

Abstract: Fluorinated alkoxy compounds of copper, copper-calcium, copper-strontium, and copper-barium having the structure:Cu.sub.W (OR).sub.X Y.sub.Y L.sub.Z ; orM.sub.a Ci.sub.b (OR).sub.c,in which 1.ltoreq.w.ltoreq.4; R is a fluorinated alkyl group; x.gtoreq.1; Y is an alkoxy or alkyl group without beta-hydrogen; y.gtoreq.0; w.ltoreq.(x +y).ltoreq.2w; L is a Lewis base; 0.ltoreq.z.ltoreq.2w; M is Ca, Sr, or Ba; and 1.ltoreq.a.ltoreq.4; 1.ltoreq.b.ltoreq.4; (b+2a).ltoreq.c.ltoreq.2(b+a), have exceptionally high volatilities, and hence low vaporization or sublimation temperatures, at 10.sup.-5 torr. They are superior precursor compounds for chemical vapor deposition of thin films on substrates under vacuum, and for sol-gel processing.

Abstract: Fluorinated alkoxy compounds of copper, copper-calcium, copper-strontium, and copper-barium having the structure:Cu.sub.w (OR).sub.x Y.sub.y L.sub.z ; orM.sub.a Cu.sub.b (OR).sub.c,in which 1.ltoreq.w.ltoreq.4; R is a fluorinated alkyl group; x.gtoreq.1; Y is an alkoxy or alkyl group without beta-hydrogen; y.gtoreq.0; w.ltoreq.(x+y).ltoreq.2w; L is a Lewis base; 1.ltoreq.z.ltoreq.2w; M is Ca, Sr, or Ba; and 1.ltoreq.a.ltoreq.4; 1.ltoreq.b.ltoreq.4; (b+2a).ltoreq.c.ltoreq.2(b+a), have exceptionally high volatilities, and hence low vaporization or sublimation temperatures, at 10.sup.-5 torr. They are superior precursor compounds for chemical vapor deposition of thin films on substrates under vacuum, and for sol-gel processing.

Abstract: The invention relates to precursors useful for the preparation by CVD of superconducting thin films. The precursors are the volatile alkoxides of the formula M(OR).sub.2, wherein M is selected from the group consisting of Ba, Ca, and Sr, and R is selected from the group consisting of unsubstituted alkyl groups of 6 to 13 carbons and halogen substituted alkyl groups of 3 to 4 carbons wherein the halogen is selected from the group consisting of fluoride and chlorine and at least two of the halogen substitutions are fluorine. The secondary or tertiary alkyl groups are preferred and the tertiary alkyl groups are most preferred.

Abstract: The invention relates to volatile mixed metal alkoxides of the formula M'.sub.x M.sub.y Cu.sub.z (OR).sub.x+2(y+z) wherein M is selected from the group consisting of Ba, Sr, and Ca, M' is an alkali metal, x=0-6, y=0-4 and z=1 to 6, and x and y are not 0 at the same time, and R is selected from the group consisting of CMe.sub.3, CMe.sub.2 Et, CMeEt.sub.2, CMe.sub.2 Pr, CMeEtPr, CEt.sub.3 or combinations of these substituents. Volatile alkoxides of Y and Cu are known. These volatile alkoxides can be used in a CVD process where stoichiometric quantities of the material are sublimated, transported to a substrate and decomposed to an oxide with or without the presence of oxygen. The oxides are then treated in a known manner to produce the superconducting film.