Abstract: Some devices, systems, and methods calculate a transition region periodicity as a least a common multiple of a first periodicity of a first uniform-feature segment and a second periodicity of a second uniform-feature segment; determine a plurality of periodic elements of the transition region based on the transition region periodicity; determine a number of drops for each periodic element of the plurality of periodic elements of the transition region based on a volume requirement of the periodic element; and select, for each periodic element of the plurality of periodic elements of the transition region, a transition-region drop pattern that has the number of drops and that minimizes a metric that is a weighted sum of inverse distances between drops in the periodic element and drops in the first uniform-feature segment and the second uniform-feature segment that are adjacent to the periodic element.

Abstract: An imprint lithography template including an alignment mark including at least two columns or at least two rows of features spaced apart from one another, and a dummy-fill region, wherein the alignment mark is spaced apart from the dummy-fill region, and wherein a closest distance between the at least two columns or the at least two rows is less than a closest distance between any portion of the at least two columns or the at least two rows and the dummy-fill region. In an embodiment, the at least two columns or the at least two rows are spaced apart by at least 0.5 microns. In a further embodiment, the closest distance between the at least two columns or the at least two rows and the dummy-fill region is at least 2 microns.

Abstract: An imprint lithography template including an alignment mark including at least two columns or at least two rows of features spaced apart from one another, and a dummy-fill region, wherein the alignment mark is spaced apart from the dummy-fill region, and wherein a closest distance between the at least two columns or the at least two rows is less than a closest distance between any portion of the at least two columns or the at least two rows and the dummy-fill region. In an embodiment, the at least two columns or the at least two rows are spaced apart by at least 0.5 microns. In a further embodiment, the closest distance between the at least two columns or the at least two rows and the dummy-fill region is at least 2 microns.

Abstract: A component for use in a disc drive includes a component substrate having a substrate surface. A self-assembled image layer is formed over the substrate surface. The self-assembled image layer includes a developed region defining a feature with a developed width. Each component also includes a feature layer that is self-assembled over the image layer. The feature layer is joined by a self-assembly process to the developed region. The feature layer has a feature width that is limited to the developed width.

Abstract: A lithography method for plating sub-100 nm narrow trenches, including providing a thin undercoat dissolution layer intermediate a seed layer and a resist layer, wherein the undercoat dissolution layer is relatively completely cleared off the seed layer by the developer solution such that the sides of the narrow trench will be generally vertical, particularly at the base of the narrow trench, thus facilitating plating the narrow trench with a high magnetic moment material.

Abstract: A method for making a magnetic sensor for a disk drive read head, the method comprising the steps of depositing a magnetoresistive stack on a surface of a first layer of material, depositing a resist layer on a first portion of the magnetoresistive stack, removing a second portion of the magnetoresistive stack not covered by the resist layer, depositing a layer of additional material on the magnetoresistive stack, the resist material, and the surface of the first layer, removing the additional material from sidewalls of the resist material, and using a lift-off process to remove the resist material. Magnetic sensors made by the above process are also included.

Abstract: A write head comprises a yoke including a top pole and a bottom pole, the top pole including a layer of insulating material, a layer of a first magnetic material positioned on a surface of the layer of insulating material, the first magnetic material having a first end positioned adjacent to an air bearing surface of the write pole, and a layer of a second magnetic material positioned on the surface of the layer of insulating material, the second magnetic material having a lower magnetic moment than the first magnetic material and being positioned to conduct magnetic flux between the return pole and the layer of first magnetic material. The method of constructing the write head and a disc drive including the write head are also included.

Abstract: A component for use in a disc drive includes a component substrate having a substrate surface. A self-assembled image layer is formed over the substrate surface. The self-assembled image layer includes a developed region defining a feature with a developed width. Each component also includes a feature layer that is self-assembled over the image layer. The feature layer is joined by a self-assembly process to the developed region. The feature layer has a feature width that is limited to the developed width.

Abstract: A magnetic material structure is provided according to the present invention that is capable of being lithographically patterned for various uses, such as, but not limited to, magnetic read/write devices. The magnetic material structure includes a layer of magnetic material provided on a wafer or other substrate, a layer of non-magnetic material provided on top of the layer of magnetic material, and a layer of soft magnetic material provided on top of the layer of non-magnetic material. The magnetic material which is to be patterned will have a magnetic field component normal to a plane of the layer of magnetic material. To minimize the effect this normal magnetic field component will have on electrons as they impinge the structure surface during e-beam lithography, the soft magnetic material has a high-plane permeability sufficient to divert the normal magnetic field component of the magnetic material into a plane of the layer of soft magnetic material.

Abstract: A lithography method for plating sub-100 nm narrow trenches, including providing a thin undercoat dissolution layer intermediate a seed layer and a resist layer, wherein the undercoat dissolution layer is relatively completely cleared off the seed layer by the developer solution such that the sides of the narrow trench will be generally vertical, particularly at the base of the narrow trench, thus facilitating plating the narrow trench with a high magnetic moment material

Abstract: A write head comprises a yoke including a top pole and a bottom pole, the top pole including a layer of insulating material, a layer of a first magnetic material positioned on a surface of the layer of insulating material, the first magnetic material having a first end positioned adjacent to an air bearing surface of the write pole, and a layer of a second magnetic material positioned on the surface of the layer of insulating material, the second magnetic material having a lower magnetic moment than the first magnetic material and being positioned to conduct magnetic flux between the return pole and the layer of first magnetic material. The method of constructing the write head and a disc drive including the write head are also included.

Abstract: A single layer resist lift-off process and apparatus for sub-micron features can include applying concentrated, localized megasonic energy on the surface of a wafer to break sidewall dielectric layers on a lift-off structure to facilitate successful lift-off. Additional steps can include using surfactants in the lift-off fluid to enhance wetting and controlling the chemistry of the lift-off fluid to create conditions which facilitate effective lift-off by creating repulsive Van der Waals forces between the lift-off structures and underlying surfaces. The lift-off fluid can also be formulated to react with the photoresist so that when the sidewall layer is cracked, the reaction between the lift-off fluid and the photoresist can initiate and speed the lift-off process. The lift-off apparatus can include a megasonic head having multiple transducer elements which can be individually operated at different frequencies and power levels to optimize lift-off of differently sized features on the wafer.

Abstract: A substantially defect-free, low-k dielectric film having improved adhesion is provided by (a) applying a silane coupling agent containing at least one polymerizable group to a surface of a substrate so as to provide a substantially uniform coating of said silane-coupling agent on said substrate; (b) heating the substrate containing the coating of the silane-coupling agent at a temperature of about 90° C. or above so as to provide a surface containing Si—O bonds; (c) rinsing the heated substrate with a suitable solvent that is effective in removing any residual silane-coupling agent; and (d) applying a dielectric material to the rinsed surface containing the Si—O bonds.

Abstract: A substantially defect-free, low-k dielectric film having improved adhesion is provided by (a) applying a silane coupling agent containing at least one polymerizable group to a surface of a substrate so as to provide a substantially uniform coating of said silane-coupling agent on said substrate; (b) heating the substrate containing the coating of the silane-coupling agent at a temperature of about 90° C. or above so as to provide a surface containing Si—O bonds; (c) rinsing the heated substrate with a suitable solvent that is effective in removing any residual silane-coupling agent; and (d) applying a dielectric material to the rinsed surface containing the Si—O bonds.

Abstract: A method for making a magnetic sensor for a disk drive read head comprises the steps of fabricating a giant magnetoresistive stack on a surface of a layer of bottom shield material, the giant magnetoresistive stack including an etch stop layer positioned on an end of the giant magnetoresistive stack opposite the surface and a buffer layer positioned on the etch stop layer, depositing an insulating material on the giant magnetoresistive stack and the surface of the layer of bottom shield material, planarizing the insulating material to form a top surface of the insulating material lying in a plane adjacent to or passing through the buffer layer, vacuum etching the buffer layer, and depositing a top shield layer on the insulating material and the giant magnetoresistive stack. A self-planarizing material can also be deposited on the insulating material.

Abstract: A method for making a magnetic sensor for a disk drive read head, the method comprising the steps of depositing a magnetoresistive stack on a surface of a first layer of material, depositing a resist layer on a first portion of the magnetoresistive stack, removing a second portion of the magnetoresistive stack not covered by the resist layer, depositing a layer of additional material on the magnetoresistive stack, the resist material, and the surface of the first layer, removing the additional material from sidewalls of the resist material, and using a lift-off process to remove the resist material. Magnetic sensors made by the above process are also included.