Patents by Inventor Andrew Sebastian Alimonda

Andrew Sebastian Alimonda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithographically patterned spring contact
    Patent number: 6264477
    Abstract: A photolithographically patterned spring contact is formed on a substrate and electrically connects contact pads on two devices. The spring contact also compensates for thermal and mechanical variations and other environmental factors. An inherent stress gradient in the spring contact causes a free portion of the spring contact to bend up and away from the substrate. An anchor portion remains fixed to the substrate and is electrically connected to a first contact pad on the substrate. The spring contact is made of an elastic material and the free portion compliantly contacts a second contact pad, thereby electrically interconnecting the two contact pads. The free portion is initially fixed to the substrate to intentionally form the inherent stress gradient in the elastic member. The free portion is released from the substrate by etching a release layer deposited on the substrate so the inherent stress gradient in the elastic member biases the free portion away from the substrate.
    Type: Grant
    Filed: April 6, 2000
    Date of Patent: July 24, 2001
    Assignee: Xerox Corporation
    Inventors: Donald Leonard Smith, Andrew Sebastian Alimonda
  • Photolithographically patterned spring contact
    Patent number: 6184065
    Abstract: A photolithographically patterned spring contact is formed on a substrate and electrically connects contact pads on two devices. The spring contact also compensates for thermal and mechanical variations and other environmental factors. An inherent stress gradient in the spring contact causes a free portion of the spring contact to bend up and away from the substrate. An anchor portion remains fixed to the substrate and is electrically connected to a first contact pad on the substrate. The spring contact is made of an elastic material and the free portion compliantly contacts a second contact pad, thereby electrically interconnecting the two contact pads.
    Type: Grant
    Filed: March 25, 1999
    Date of Patent: February 6, 2001
    Assignee: Xerox Corporation
    Inventors: Donald Leonard Smith, Andrew Sebastian Alimonda
  • Photolithographically patterned spring contact
    Patent number: 6184699
    Abstract: A photolithographically patterned spring contact is formed on a substrate and electrically connects contact pads on two devices. The spring contact also compensates for thermal and mechanical variations and other environmental factors. An inherent stress gradient in the spring contact causes a free portion of the spring contact to bend up and away from the substrate. An anchor portion remains fixed to the substrate and is electrically connected to a first contact pad on the substrate. The spring contact is made of an elastic material and the free portion compliantly contacts a second contact pad, thereby electrically interconnecting the two contact pads.
    Type: Grant
    Filed: December 14, 1998
    Date of Patent: February 6, 2001
    Assignee: Xerox Corporation
    Inventors: Donald Leonard Smith, Andrew Sebastian Alimonda
  • Method for forming a spring contact
    Patent number: 5914218
    Abstract: A photolithographically patterned spring contact is formed on a substrate and electrically connects contact pads on two devices. The spring contact also compensates for thermal and mechanical variations and other environmental factors. An inherent stress gradient in the spring contact causes a free portion of the spring contact to bend up and away from the substrate. An anchor portion remains fixed to the substrate and is electrically connected to a first contact pad on the substrate. The spring contact is made of an elastic material and the free portion compliantly contacts a second contact pad, thereby electrically interconnecting the two contact pads.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: June 22, 1999
    Assignee: Xerox Corporation
    Inventors: Donald Leonard Smith, Andrew Sebastian Alimonda
  • Photolithographically patterned spring contact
    Patent number: 5848685
    Abstract: A photolithographically patterned spring contact is formed on a substrate and electrically connects contact pads on two devices. The spring contact also compensates for thermal and mechanical variations and other environmental factors. An inherent stress gradient in the spring contact causes a free portion of the spring contact to bend up and away from the substrate. An anchor portion remains fixed to the substrate and is electrically connected to a first contact pad on the substrate. The spring contact is made of an elastic material and the free portion compliantly contacts a second contact pad, thereby electrically interconnecting the two contact pads.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: December 15, 1998
    Assignee: Xerox Corporation
    Inventors: Donald Leonard Smith, Andrew Sebastian Alimonda