Patents by Inventor Andrew Sobek

Andrew Sobek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7612146
    Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
    Type: Grant
    Filed: September 7, 2005
    Date of Patent: November 3, 2009
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Larry F. Rhodes, Richard Vicari, Leah J. Langsdorf, Andrew A. Sobek, Edwin P. Boyd, Brian Bennett
  • Publication number: 20080124248
    Abstract: This invention relates to methods, compositions, and kits for the capture, measurement, and quantification of endotoxins, glucans, or their combination in samples taken from indoor air.
    Type: Application
    Filed: November 29, 2006
    Publication date: May 29, 2008
    Inventors: Edward Andrew Sobek, James Harold Campbell
  • Publication number: 20060025540
    Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition.
    Type: Application
    Filed: September 7, 2005
    Publication date: February 2, 2006
    Inventors: Larry Rhodes, Richard Vicari, Leah Langsdorf, Andrew Sobek, Edwin Boyd, Brian Bennett
  • Patent number: 6949609
    Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: September 27, 2005
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Larry F. Rhodes, Richard Vicari, Leah J. Langsdorf, Andrew A. Sobek, Edwin P. Boyd, Brian Bennett
  • Publication number: 20030176583
    Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
    Type: Application
    Filed: December 12, 2002
    Publication date: September 18, 2003
    Inventors: Larry F. Rhodes, Richard Vicari, Leah J. Langsdorf, Andrew A. Sobek, Edwin P. Boyd, Brian Bennett
  • Patent number: 4869905
    Abstract: Various chemolithotrophic bacteria such as Thiobacillus ferrooxidans by direct or indirect mechanisms catalyze the oxidation of metal sulfides and produce acid, i.e. sulfuric acid and soluble metal salts at a much faster rate than chemical oxidation. Elimination of such bacteria would inhibit the formation of the acid. The natural production of such acids is particularly troublesome in mines e.g. coal mines, since acid water is produced which is damaging to the environment. An effective method of abating or eliminating such acid water production is to apply a bactericide such as a biodegradable organic surfactant which at low pH values are bactericides and hence inhibit the bacteria from catalyzing the metal sulfides. The affected acid water site can thus be treated with the surfactant which provides a temporary or short term result usually for a few months.
    Type: Grant
    Filed: May 12, 1987
    Date of Patent: September 26, 1989
    Assignee: The B. F. Goodrich Company
    Inventors: Andrew A. Sobek, Eric Reutern, Jerry B. Pausch