Patents by Inventor Andrew T. Heitsch

Andrew T. Heitsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210221924
    Abstract: A heterogeneous procatalyst includes a preformed heterogeneous procatalyst and a metal-ligand complex. The preformed heterogeneous procatalyst includes a titanium species and a magnesium chloride (MgCl2) support. The metal-ligand complex has a structural formula (L)aM(Y)m(XR2)b, where M is a metal cation; each L is a neutral ligand or (?O); each Y is a halide or (C1-C20)alkyl; each XR2 is an anionic ligand in which X is a heteroatom or a heteroatom-containing functional group and R2 is (C1-C20)hydrocarbyl or (C1-C20) heterohydrocarbyl; n is 0, 1, or 2; m is 0-4; and b is 1-6. The metal-ligand complex is overall charge neutral. The heterogeneous procatalyst exhibits improved average molecular weight capability. A catalyst system includes the heterogeneous procatalyst and a cocatalyst. Processes for producing the heterogeneous procatalyst and processes for producing ethylene-based polymers utilizing the heterogeneous procatalyst are also disclosed.
    Type: Application
    Filed: May 29, 2019
    Publication date: July 22, 2021
    Applicant: Dow Global Technologies LLC
    Inventors: Linfeng Chen, Mingzhe Yu, Mehmet Demirors, Andrew T. Heitsch, Jeffrey A. Sims, David Gordon Barton, Kurt F. Hirsekorn, Peter N. Nickias
  • Publication number: 20210205785
    Abstract: A heterogeneous procatalyst includes a titanium species, a magnesium chloride component, and a chlorinating agent having a structure A(C)x(R1)3-x, where A is aluminum or boron, R1 is a (C1-C30) hydrocarbyl, and x is 1, 2, or 3. The magnesium chloride component may be thermally treated at a temperature greater than 100 C for at least 30 minutes before or after introduction of the chlorinating agent and titanium species to the heterogeneous procatalyst. The heterogeneous procatalyst having the thermally treated magnesium chloride exhibits improved average molecular weight capability. Processes for producing the heterogeneous procatalyst and processes for producing ethylene-based polymers utilizing the heterogeneous procatalyst are also disclosed.
    Type: Application
    Filed: May 23, 2019
    Publication date: July 8, 2021
    Applicant: Dow Global Technologies LLC
    Inventors: Mingzhe Yu, David Gordon Barton, Kurt F. Hirsekorn, Sadeka Onam, Peter N. Nickias, Andrew T. Heitsch, Thomas H. Peterson
  • Patent number: 10829434
    Abstract: A method for preparing methyl methacrylate from methacrolein and methanol. The method comprises contacting a mixture comprising methacrolein, methanol and oxygen with a heterogeneous catalyst comprising a support and a noble metal, wherein said catalyst has an average diameter of at least 200 microns and average concentration of methacrolein is at least 15 wt %.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: November 10, 2020
    Assignees: Dow Global Technologies LLC, Rohm and Haas Company
    Inventors: Dmitry A. Krapchetov, Kirk W. Limbach, Daniel A. Hickman, Andrew T. Heitsch, Victor Sussman, Wen Sheng Lee, Ramzy Shayib
  • Publication number: 20200171465
    Abstract: A method for preparing a heterogeneous catalyst. The method comprises steps of: (a) combining (i) a support, (ii) an aqueous solution of a noble metal compound and (iii) a C2-C18 thiol comprising at least one hydroxyl or carboxylic acid substituent; to form a wet particle and (b) removing water from the wet particle by drying followed by calcination to produce the catalyst.
    Type: Application
    Filed: June 25, 2018
    Publication date: June 4, 2020
    Inventors: Victor Sussman, Wen Sheng Lee, Jeffrey Herron, D. Wayne Blaylock, Daniel J. Arriola, Andrew T. Heitsch, Alexey Kirilin, Heidi Clements, Abrin L. Schmucker, Daniel A. Hickman
  • Publication number: 20200165185
    Abstract: A method for preparing methyl methacrylate from methacrolein and methanol. The method comprises contacting a mixture comprising methacrolein, methanol and oxygen with a heterogeneous catalyst comprising a support and a noble metal, wherein said catalyst has an average diameter of at least 200 microns and at least 90 wt % of the noble metal is in the outer 50% of catalyst volume. A method for preparing methyl methacrylate from methacrolein and methanol. The method comprises contacting a mixture comprising methacrolein, methanol and oxygen with a heterogeneous catalyst comprising a support and a noble metal; wherein said catalyst has an average diameter of at least 200 microns and average concentration of methacrolein is at least 15 wt %.
    Type: Application
    Filed: June 25, 2018
    Publication date: May 28, 2020
    Inventors: Dmitry A. Krapchetov, Kirk W. Limbach, Daniel A. Hickman, Andrew T. Heitsch, Victor Sussman, Wen Sheng Lee, Ramzy Shayib
  • Publication number: 20200020538
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a composition comprising a dopant-containing copolymer and a solvent on a substrate; and annealing the substrate at a temperature of 750 to 1300° C. for 0.1 second to 24 hours to diffuse a dopant into the substrate; wherein the dopant-containing copolymer comprises a non-dopant-containing polymer and a dopant-containing polymer; and where the dopant-containing polymer is a polymer having a covalently or ionically bound dopant atom and is present in a smaller volume fraction than the non-dopant-containing polymer.
    Type: Application
    Filed: July 11, 2018
    Publication date: January 16, 2020
    Inventors: Yuanyi Zhang, Reika Katsumata, Mingqi Li, Bhooshan C. Popere, Andrew T. Heitsch, Peter Trefonas, III, Rachel A. Segalman
  • Patent number: 10340144
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a copolymer, a dopant precursor and a solvent on a substrate; where the copolymer is capable of phase segregating and embedding the dopant precursor while in solution; and annealing the substrate at a temperature of 750 to 1300° C. for 0.1 second to 24 hours to diffuse the dopant into the substrate. Disclosed herein too is a semiconductor substrate comprising embedded dopant domains of diameter 3 to 30 nanometers; where the domains comprise Group 13 or Group 15 atoms, wherein the embedded spherical domains are located within 30 nanometers of the substrate surface.
    Type: Grant
    Filed: January 12, 2017
    Date of Patent: July 2, 2019
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, DOW GLOBAL TECHNOLOGIES, LLC, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Rachel A. Segalman, Peter Trefonas, III, Bhooshan C. Popere, Andrew T. Heitsch
  • Publication number: 20170194150
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a copolymer, a dopant precursor and a solvent on a substrate; where the copolymer is capable of phase segregating and embedding the dopant precursor while in solution; and annealing the substrate at a temperature of 750 to 1300° C. for 0.1 second to 24 hours to diffuse the dopant into the substrate. Disclosed herein too is a semiconductor substrate comprising embedded dopant domains of diameter 3 to 30 nanometers; where the domains comprise Group 13 or Group 15 atoms, wherein the embedded spherical domains are located within 30 nanometers of the substrate surface.
    Type: Application
    Filed: January 12, 2017
    Publication date: July 6, 2017
    Inventors: Rachel A. Segalman, Peter Trefonas, III, Bhooshan C. Popere, Andrew T. Heitsch
  • Patent number: 9576799
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a copolymer, a dopant precursor and a solvent on a substrate; where the copolymer is capable of phase segregating and embedding the dopant precursor while in solution; and annealing the substrate at a temperature of 750 to 1300° C. for 0.1 second to 24 hours to diffuse the dopant into the substrate. Disclosed herein too is a semiconductor substrate comprising embedded dopant domains of diameter 3 to 30 nanometers; where the domains comprise Group 13 or Group 15 atoms, wherein the embedded spherical domains are located within 30 nanometers of the substrate surface.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: February 21, 2017
    Assignees: DOW GLOBAL TECHNOLOGIES, LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Rachel A. Segalman, Peter Trefonas, III, Bhooshan C. Popere, Andrew T. Heitsch
  • Publication number: 20160035572
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a copolymer, a dopant precursor and a solvent on a substrate; where the copolymer is capable of phase segregating and embedding the dopant precursor while in solution; and annealing the substrate at a temperature of 750 to 1300° C. for 0.1 second to 24 hours to diffuse the dopant into the substrate. Disclosed herein too is a semiconductor substrate comprising embedded dopant domains of diameter 3 to 30 nanometers; where the domains comprise Group 13 or Group 15 atoms, wherein the embedded spherical domains are located within 30 nanometers of the substrate surface.
    Type: Application
    Filed: April 29, 2015
    Publication date: February 4, 2016
    Inventors: Rachel A. Segalman, Peter Trefonas, III, Bhooshan C. Popere, Andrew T. Heitsch
  • Patent number: 8858707
    Abstract: A method for making silicon nanorods is provided. In accordance with the method, Au nanocrystals are reacted with a silane in a liquid medium to form nanorods, wherein each of said nanorods has an average diameter within the range of about 1.2 nm to about 10 nm and has a length within the range of about 1 nm to about 100 nm.
    Type: Grant
    Filed: April 14, 2010
    Date of Patent: October 14, 2014
    Assignee: Merck Patent GmbH
    Inventors: Andrew T. Heitsch, Colin M. Hessel, Brian A. Korgel
  • Publication number: 20120077034
    Abstract: A method for making silicon nanorods is provided. In accordance with the method, Au nanocrystals are reacted with a silane in a liquid medium to form nanorods, wherein each of said nanorods has an average diameter within the range of about 1.2 nm to about 10 nm and has a length within the range of about 1 nm to about 100 nm.
    Type: Application
    Filed: April 14, 2010
    Publication date: March 29, 2012
    Inventors: Andrew T. Heitsch, Colin M. Hessel, Brian A. Korgel