Patents by Inventor Andrewe KUMMEL

Andrewe KUMMEL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LOW-TEMPERATURE ATOMIC LAYER DEPOSITION OF BORON NITRIDE AND BN STRUCTURES
    Publication number: 20180040476
    Abstract: Methods of the disclosure include a BN ALD process at low temperatures using a reactive nitrogen precursor, such as thermal N2H4, and a boron containing precursor, which allows for the deposition of ultra thin (less than 5 nm) films with precise thickness and composition control. Methods are self-limiting and provide saturating atomic layer deposition (ALD) of a boron nitride (BN) layer on various semiconductors and metallic substrates.
    Type: Application
    Filed: August 10, 2017
    Publication date: February 8, 2018
    Inventors: Steven WOLF, Mary EDMONDS, Andrewe KUMMEL, Srinivas NEMANI, Ellie YIEH