Patents by Inventor Andrey Alexandrovich NIKIPELOV

Andrey Alexandrovich NIKIPELOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • AN UNDULATOR
    Publication number: 20170184975
    Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.
    Type: Application
    Filed: March 30, 2015
    Publication date: June 29, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich NIKIPELOV, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Erik Roelof LOOPSTRA, Michael Jozef Mathijs RENKENS, Adrian TOMA, Han-Kwang NIENHUYS
  • ELECTRON INJECTOR AND FREE ELECTRON LASER
    Publication number: 20160301180
    Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
    Type: Application
    Filed: November 27, 2014
    Publication date: October 13, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Johannes Antonius Gerardus AKKERMANS, Erik LOOPSTRA, Wouter Joep ENGELEN, Petrus Rutgerus BARTRAIJ, Teis Johan COENEN, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
  • BEAM DELIVERY APPARATUS AND METHOD
    Publication number: 20160225477
    Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
    Type: Application
    Filed: September 24, 2014
    Publication date: August 4, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Yevgenyevich BANINE, Peturs Rutgerus BARTRAIJ, Ramon Pascal VAN GORKOM, Lucas Johannes Peter AMENT, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Rilpho Ludovicus DONKER, Wouter Joep ENGELEN, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Erik Roelof LOOPSTRA, Han-Kwang NIENHUYS, Andrey Alexandrovich NIKIPELOV, Michael Jozef Mathijs RENKENS, Franciscus Johannes Joseph JANSSEN, Borgert KRUIZINGA
  • LITHOGRAPHIC METHOD
    Publication number: 20160147161
    Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
    Type: Application
    Filed: June 17, 2014
    Publication date: May 26, 2016
    Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO