Abstract: A plasma lamp is provided that employs excitation transfer between two atomic or molecular species so as to preferentially produce light at a specific atomic or molecular emission wavelength. The lamp includes a lamp body. The lamp body includes a top portion, a middle portion having an internal hollow space filled with an energy-donor chemical gas and an energy-acceptor chemical element, and a bottom portion. The lamp body further includes an array of a plurality of cavities connected to the internal hollow space. The internal hollow space and the array of the plurality of cavities are spaced apart from outer surfaces of the lamp body.

Abstract: A microheater comprises an optical fiber including a rare earth-doped glass core surrounded by a glass cladding. The rare earth-doped glass core comprises a rare earth dopant at a concentration sufficient for luminescence quenching such that, when the rare earth dopant is pumped with light at an absorption band wavelength, at least about 90% of absorbed pump light is converted into heat.

Abstract: A light generation and light distribution method. The method includes generating laser light with a semiconductor laser or an array of semiconductor lasers at a generation location. Light generated by the semiconductor laser is guided to a frequency converter. Light converted by the frequency converter is directed to a plurality of distribution locations. The distribution locations can be remote or local. A light generation and light distribution system includes a semiconductor laser or array of lasers at a generation location. A frequency-conversion optical component modifies the wavelength of the radiation generated by the semiconductor laser to one or more desired wavelengths for disinfection, medical therapy, photochemical processes, and/or lighting. Light extraction and distribution optical components extract from the distribution system a portion of the light in the system so as to provide for one or more of disinfection, medical therapies, general or background lighting, and photochemical processes.

Abstract: A method for photoresist-free photolithography to pattern a surface of conductor or semiconductor substrate and deposit a material includes surface cleaning and irradiating a surface through a mask with VUV photons from a lamp. Photons are generated with a VUV lamp having a wavelength of 160 nm-200 nm and with an intensity sufficient to alter the surface. The photons are directed through a mask pattern to alter the surface chemistry or structure in those areas of the substrate defined by the mask. Material is selectively deposited onto the surface, in those portions of the surface that are exposed to the VUV photons, or unexposed to the VUV photons, depending on the substrate surface. A method uses a seed film and then electroplates metal onto the seed film in the mask pattern. A method provides for electroless deposition of metal and another for altering surface chemistry in the mask pattern.

Abstract: An in-chamber plasma source in a deposition reactor system includes an array of microcavity or microchannel plasma devices having a first electrode and a second electrode isolated from plasma in microcavities or microchannels. An inlet provides connection to deposition precursor. A region interacts deposition precursor with plasma. An outlet directs precursor dissociated with the plasma onto a substrate for deposition. A reactor system includes a substrate holder across from the outlet, a chamber enclosing the in-chamber plasma source and the substrate holder, an exhaust from the chamber, and conduit supplying precursors from sources or bubblers to the inlet. A reactor system can conduct plasma enhanced atomic layer deposition at high pressures and is capable of forming a complete layer in a single cycle.

Abstract: A fabrication tool has at least one flat lamp photon source, or an array of flat lamps, that serve to non-thermally ablate polymer material from a surface. No photoresist is required and the desired photoablated pattern is determined by inserting a photolithographic mask between the lamp(s) and the surface to be processed. Methods of the invention pattern organic polymer and can pattern a substrate using a pattern established in an organic polymer layer on the substrate, and can also deposit materials in the pattern by breaking bonds in deposition precursors with photons from the microplasma array. Another method converts organic polymer material to have a hydrophylic surface. A tool of the invention can have width and depth comparable to a typical paperback book and a height comparable to a coffee cup.

Abstract: A microheater comprises an optical fiber including a rare earth-doped glass core surrounded by a glass cladding. The rare earth-doped glass core comprises a rare earth dopant at a concentration sufficient for luminescence quenching such that, when the rare earth dopant is pumped with light at an absorption band wavelength, at least about 90% of absorbed pump light is converted into heat.

Abstract: A method for generating a hybrid reaction flows feedstock gas that is also a plasma medium through microchannels. Plasma is generated with the plasma medium via excitation with a time-varying voltage. UV or VUV emissions are generated at a wavelength selected to break a chemical bond in the feedstock gas. The UV or VUV emissions are directed into the microchannels to interact with the plasma medium and generate a reaction product from the plasma medium. A hybrid reactor device includes a microchannel plasma array having inlets and outlets for respectively flowing gas feedstock into and reaction product out of the microchannel plasma array. A UV or VUV emission lamp has its emissions directed into microchannels of the microchannel plasma array. Electrodes ignite plasma in the microchannels and stimulating the UV or VUV emission lamp to generate UV or VUV emissions. One common or plural phased time-varying voltage sources drive the plasma array and the UV or VUV emission lamp.

Abstract: A method for generating a hybrid reaction flows feedstock gas that is also a plasma medium through microchannels. Plasma is generated with the plasma medium via excitation with a time-varying voltage. UV or VUV emissions are generated at a wavelength selected to break a chemical bond in the feedstock gas. The UV or VUV emissions are directed into the microchannels to interact with the plasma medium and generate a reaction product from the plasma medium. A hybrid reactor device includes a microchannel plasma array having inlets and outlets for respectively flowing gas feedstock into and reaction product out of the microchannel plasma array. A UV or VUV emission lamp has its emissions directed into microchannels of the microchannel plasma array. Electrodes ignite plasma in the microchannels and stimulating the UV or VUV emission lamp to generate UV or VUV emissions. One common or plural phased time-varying voltage sources drive the plasma array and the UV or VUV emission lamp.