Patents by Inventor Andrey ZAKHAROV

Andrey ZAKHAROV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Enhancing transistor performance by reducing exposure to oxygen plasma in a dual stress liner approach
    Patent number: 9318345
    Abstract: When forming strain-inducing dielectric material layers above transistors of different conductivity type, the patterning of at least one strain-inducing dielectric material may be accomplished on the basis of a process sequence in which a negative influence of a fluorine species in an oxygen plasma upon removing the resist mask is avoided or at least significantly suppressed. For example, a substantially oxygen-free plasma process may be applied for removing the resist material.
    Type: Grant
    Filed: October 5, 2011
    Date of Patent: April 19, 2016
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Ronald Naumann, Volker Grimm, Andrey Zakharov, Ralf Richter
  • Enhancing Transistor Performance by Reducing Exposure to Oxygen Plasma in a Dual Stress Liner Approach
    Publication number: 20130089985
    Abstract: When forming strain-inducing dielectric material layers above transistors of different conductivity type, the patterning of at least one strain-inducing dielectric material may be accomplished on the basis of a process sequence in which a negative influence of a fluorine species in an oxygen plasma upon removing the resist mask is avoided or at least significantly suppressed. For example, a substantially oxygen-free plasma process may be applied for removing the resist material.
    Type: Application
    Filed: October 5, 2011
    Publication date: April 11, 2013
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Ronald NAUMANN, Volker GRIMM, Andrey ZAKHAROV, Ralf RICHTER