Abstract: A gas sensor has a light detector, a gas-tight support structure enclosing the light detector, a window positioned in said support structure, and a light source mounted to the support structure. A sample area is positioned in the support structure to receive a gas to be tested. The light source is aligned with the window, sample area, and the light detector to pass light from the light source through the gas in the sample area to the light detector. The sensor can be provided in a breadth sampling apparatus that has deflects gas to a bypass route so that only a portion of gas reaches the sensor.

Abstract: A gas sensor has a light detector, a gas-tight support structure enclosing the light detector, a window positioned in said support structure, and a light source mounted to the support structure. A sample area is positioned in the support structure to receive a gas to be tested. The light source is aligned with the window, sample area, and the light detector to pass light from the light source through the gas in the sample area to the light detector. The sensor can be provided in a breadth sampling apparatus that has deflects gas to a bypass route so that only a portion of gas reaches the sensor.

Abstract: A gas sensor has a light detector, a gas-tight support structure enclosing the light detector, a window positioned in said support structure, and a light source mounted to the support structure. A sample area is positioned in the support structure to receive a gas to be tested. The light source is aligned with the window, sample area, and the light detector to pass light from the light source through the gas in the sample area to the light detector. The sensor can be provided in a breadth sampling apparatus that has deflects gas to a bypass route so that only a portion of gas reaches the sensor.

Abstract: A gas sensor has a light detector, a gas-tight support structure enclosing the light detector, a window positioned in said support structure, and a light source mounted to the support structure. A sample area is positioned in the support structure to receive a gas to be tested. The light source is aligned with the window, sample area, and the light detector to pass light from the light source through the gas in the sample area to the light detector. The sensor can be provided in a breadth sampling apparatus that has deflects gas to a bypass route so that only a portion of gas reaches the sensor.

Abstract: A gas sensor has a light detector, a gas-tight support structure enclosing the light detector, a window positioned in said support structure, and a light source mounted to the support structure. A sample area is positioned in the support structure to receive a gas to be tested. The light source is aligned with the window, sample area, and the light detector to pass light from the light source through the gas in the sample area to the light detector. The sensor can be provided in a breadth sampling apparatus that has deflects gas to a bypass route so that only a portion of gas reaches the sensor.

Abstract: A system includes a sensor body that has a folded optical waveguide configured in a “U” shape, wherein the waveguide is configured to convey infrared energy from one end of the waveguide to the other end of the waveguide.

Abstract: A control device and method provides control of at least one operating feature of a cooking device in response to measured smoke and/or gas produced by item(s) being cooked. The device and method may control the temperature and cooking time of the device, and may also shut off the device or provide a fire alarm.

Abstract: A method for compensating for baseline or span drift in gas sensing equipment includes obtaining gas concentration data over a time period and identifying a quiescent period within that time period. The method compares a component concentration corresponding to the quiescent period with one or more additional component concentrations relating to different quiescent periods and calculates an estimated background gas concentration for a predetermined number of time periods. The estimated background concentration is then compared to a preset, or expected, background concentration, and a correction value is calculated. For baseline drift, a correction value is determined to be the difference between the estimated background concentration and the present (expected) background concentration. For span drift, a correction value is determined to be the ratio of the estimated background concentration to the preset (expect) background concentration.

Abstract: A gas sensor (10) exposed by diffusion to a gas flow and operable to measure the presence of a particular gas component of the gas flow. The sensor (10) comprises a base (20), a diffuser (34), a source (36), a detector (38), and a detection chamber (40). The diffuser (34) is interposed between the gas flow and the detection chamber (40). Thus, rather than directly exposing the source (36), detector (38), and other electronics to the full force of the gas flow, the gas is passed to and from the detection chamber (40) by diffusion. The source (36) radiates energy having a particular characteristic such that the energy is proportionally absorbed by the gas component. The detector (38) measures the presence of any unabsorbed energy and generates an output signal indicative thereof. The detection chamber (40) is coated with a material known to reflect the radiated energy.

Abstract: An improved self-cleaning oven (10) is provided having an assembly (12) to control the cleaning cycle time of the oven (10) depending upon the degree of oven contamination and soil present therein. The assembly (12) includes a measuring chamber (16) as well as a passageway (18) communicating the interior (14) of the oven (10) and the chamber (16). A smoke detector (32) (preferably an infrared smoke detector) is associated with the chamber (16) and is coupled with a controller (20) so as to measure a parameter of smoke passing through the chamber during at least a portion of the cleaning cycle. This parameter is then used to determine the proper duration of the cleaning cycle. In preferred forms, measuring chamber (16a) is equipped with an ambient air inlet (52) and outlet (54) so as to draw an ambient air stream through the chamber (16a) between the smoke detector (32) and the oven gas stream.

Abstract: An improved self-cleaning oven (10) is provided having an assembly (12) to control the cleaning cycle time of the oven (10) depending upon the degree of oven contamination and soil present therein. The assembly (12) includes a measuring chamber (16) as well as a passageway (18) communicating the interior (14) of the oven (10) and the chamber (16). A smoke detector (32) (preferably an infrared smoke detector) is associated with the chamber (16) and is coupled with a controller (20) so as to measure a parameter of smoke passing through the chamber during at least a portion of the cleaning cycle. This parameter is then used to determine the proper duration of the cleaning cycle. In preferred forms, measuring chamber (16a) is equipped with an ambient air inlet (52) and outlet (54) so as to draw an ambient air stream through the chamber (16a) between the smoke detector (32) and the oven gas stream.

Abstract: A control device and method provides control of at least one operating feature of a cooking device in response to measured smoke and/or gas produced by item(s) being cooked. The device and method may control the temperature and cooking time of the device, and may also shut off the device or provide a fire alarm.

Abstract: An improved self-cleaning oven (10) is provided having an assembly (12) to control the cleaning cycle time of the oven (10) depending upon the degree of oven contamination and soil present therein. The assembly (12) includes a measuring chamber (16) as well as a passageway (18) communicating the interior (14) of the oven (10) and the chamber (16). A smoke detector (32) (preferably an infrared smoke detector) is associated with the chamber (16) and is coupled with a controller (20) so as to measure a parameter of smoke passing through the chamber during at least a portion of the cleaning cycle. This parameter is then used to determine the proper duration of the cleaning cycle. In preferred forms, measuring chamber (16a) is equipped with an ambient air inlet (52) and outlet (54) so as to draw an ambient air stream through the chamber (16a) between the smoke detector (32) and the oven gas stream.

Abstract: A diffusion-type NDIR gas analyzer with an improved response time due to convection flow created by a temperature gradient between gas located within a waveguide and gas located within a diffusion pocket of space created between the waveguide and a semi-permeable membrane which surrounds the waveguide. The temperature gradient may be created by a thermally resistive radiation source that is not thermally isolated from the waveguide. The semi-permeable membrane is made of a hydrophobic material and has a thickness sufficient to provide its own structural integrity. The semi-permeable membrane can have a porosity less than approximately 50 microns and be comprised of ultra high molecular weight polyethylene or Teflon®.

Abstract: A power circuit for use with a resistive thermal radiation source in which the power delivered to the resistive thermal radiation source will remain constant within a preselected deviation over a fixed period of time as the source resistance of the source varies between an initial source resistance and a second source resistance at the operating temperature. The power circuit is designed to maintain constant power within a preselected deviation by using the resistance of the resistive thermal radiation source to calculate a preselected resistance used in the power circuit according to the following equation: ##EQU1## wherein .DELTA.P=P.sub.si -P.sub.s ; P.sub.si =the initial power on the resistive thermal radiation source; P.sub.s =the power on the resistive thermal radiation source when the source resistance is equal to the second source resistance; K.sub.1 =RO/R.sub.si ; R0=the preselected resistance; R.sub.si =the initial source resistance; K.sub.2 =R.sub.s /R.sub.si ; and R.sub.