Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the LP generators are electrically connected, and a control unit. During operation, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the LP generators. The control unit is configured to select a contribution of each LP generator in order to generate a rise and/or a decay of a pulse at the output of the coupling. At least one LP generator includes an LP-generator-value limiting circuit. The LP-generator-value limiting circuit includes at least one of (i) a series circuit of a diode and a capacitor configured to clamp an overvoltage present at ends thereof, and a discharge circuit to discharge the capacitor, or (ii) a resistor and a switching element, or (iii) a variable electrically controllable impedance with a power dissipating part.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the plurality of LP generators is electrically connected, and a control unit. During operation, at least in some states of the HP generator, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the plurality of LP generators. The control unit is configured to select a respective contribution of each of the plurality of LP generators in order to generate a rise and/or a decay of a pulse at the output of the coupling. The HP generator is at least partially directly liquid cooled, by being immersed in a dielectric cooling liquid.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the plurality of LP generators is electrically connected, and a control unit. During operation, at least in some states of the HP generator, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the plurality of LP generators. The control unit is configured to select a respective contribution of each of the plurality of LP generators in order to generate a rise and/or a decay of a pulse at the output of the coupling, in a sequenced way through the plurality of LP generators. The control unit is further configured to select the respective contribution of each of the plurality of LP generators in a galvanically isolated way, via a fiber optic connection or a magnetically coupling.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the plurality of LP generators is electrically connected, and a control unit. During operation, at least in some states of the HP generator, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the plurality of LP generators. The control unit is configured to select a respective contribution of each of the plurality of LP generators in order to generate a rise and/or a decay of a pulse at the output of the coupling. The control unit further includes switching units, having a current rise capability of at least 10 A/?s, and/or having a capability of withstanding a voltage of at least 0.5 kV with voltage rise and fall rates of at least 15 kV/?s.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the LP generators are electrically connected, and a control unit. During operation, at least in some states of the HP generator, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the LP generators. The control unit is configured to select a respective contribution of each LP generator in order to generate a rise and/or a decay of a pulse at the output of the coupling. A charging energy of the LP generators is supplied over a transformer with a primary winding and a secondary winding for each LP generator. The secondary winding is connected to a rectifier, which is connected to the energy storage component of the corresponding LP generator, and/or a plurality of the primary windings is connected in series.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the plurality of LP generators is electrically connected, and a control unit. During operation, at least in some states of the HP generator, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the plurality of LP generators. The control unit is configured to select a respective contribution of each of the plurality of LP generators in order to generate a rise and/or a decay of a pulse at the output of the coupling, in a sequenced way through the plurality of LP generators. At least one pulse sequence uses a different contribution of the plurality of LP generators as a previous sequence or begins on a different LP generator as in the previous sequence.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the plurality of LP generators is electrically connected, and a control unit. During operation, at least in some states of the HP generator, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the plurality of LP generators. The control unit is configured to select a respective contribution of each of the plurality of LP generators in order to generate a rise and/or a decay of a pulse at the output of the coupling. The HP generator further includes a respective damping circuit positioned between each pair of adjacent LP generators of the plurality of LP generators in an open chain configuration. The damping circuit includes a resistor and/or an inductor.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the plurality of LP generators is electrically connected, and a control unit. During operation, at least in some states of the HP generator, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the plurality of LP generators. The control unit is configured to select a respective contribution of each of the plurality of LP generators in order to generate a rise and/or a decay of a pulse at the output of the coupling. The control unit is further configured to select the contribution of each of the plurality of LP generators in a way to reduce voltage overshoots at the output of the HP generator and/or at a dedicated location on the capacitive load.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the plurality of LP generators is electrically connected, and a control unit. During operation, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the plurality of LP generators. The control unit is configured to select a contribution of each LP generator to an output value of the HP generator, in a way that one or a combination of following is accomplished: (i) the output of the coupling and/or the output of the HP generator is a step function, (ii) the plurality of LP generators is activated sequentially during a pulse, (iii) at least one amplitude step is lower than 1 kV, and (iv) the plurality of LP generators is connected by switching only.

Abstract: A high power (HP) generator includes a plurality of low power (LP) generators, a coupling in which the plurality of LP generators is electrically connected, and a control unit. During operation, a coupling-value at an output of the coupling is higher than an LP-generator-value at an output of one of the plurality of LP generators. The control unit is configured to select a contribution of each LP generator in order to generate a rise and/or a decay of a pulse at the output of the coupling. The HP generator further includes a balancing circuit connected between two LP generators. The balancing circuit includes a component allowing a current to flow in one direction only.

Abstract: A pulsing assembly for delivering power to a plasma reactor having a first load between a first plasma reactor input port and a plasma reactor common port and having a second load between a second plasma reactor input port and the plasma reactor common port. The pulsing assembly includes a first pulsing unit, a second pulsing unit and an energy storage component connected therebetween. The first pulsing unit includes a first input port connectable to a power source, a pulsing assembly common port connectable to the plasma reactor common port, a first output port connectable to the first load of the plasma reactor for supplying pulses between the first output port and the pulsing assembly common port. The second pulsing unit includes a second input port connectable to a power source and a second output port connectable to the second load of the plasma reactor.

Abstract: A high voltage (HV) switch unit includes a plurality of semiconductor switches connected with each other in series and configured to switch on and off simultaneously, and a plurality of series circuits. Each series circuit includes a snubber energy storage component and a snubber rectifying component. Each series circuit is connected parallel to each respective semiconductor switch. The HV switch unit further includes a voltage balancing circuit comprising a plurality of balancing electronic components in combination with a voltage limiting electronic component. The plurality of balancing electronic components forms a chain parallel to the serially connected semiconductor switches. The chain is configured to transport electrical charge from one snubber energy storage component to the next only in one direction. The voltage limiting electronic component is configured to limit a voltage at an end of the chain, where the electrical charge is transported to.

Abstract: A method of balancing voltage distribution over a plurality of switches connected in series with each other in a high voltage (HV) switch is provided. A snubber arrangement is associated with each switch of the plurality of switches. The method includes, for a first snubber arrangement associated with a first switch of the plurality of switches, determining a first voltage across a first snubber energy storage component of the first snubber arrangement associated with the first switch. The method further includes, for a second snubber arrangement associated with a second switch of the plurality of switches, determining a second voltage across a second snubber energy storage component of the second snubber arrangement associated with the second switch. The method further includes comparing the first voltage and the second voltage and, based on the comparison, adjusting a first drive signal of at least the first switch based on the first voltage.

Abstract: Methods, apparatus and systems for detecting an arc during supplying a plasma process in a plasma chamber with a power are provided. An example plasma power supply includes: a DC source, an output signal generator, a first signal sequence measurement device for measuring a first signal sequence present between the DC source and the output signal generator, a second signal sequence measurement device for measuring a second signal sequence present at an output of the output signal generator, and a controller configured to generate a reference signal sequence based on one of the first and second signal sequences, to compare the reference signal sequence and the other of the first and second signal sequences that has not been used to determine the reference signal sequence, and to generate a detection signal if the reference signal sequence and the other of the first and second signal sequences cross.

Abstract: Systems and methods of monitoring a discharge in a plasma process are disclosed. The methods include supplying the plasma process with a periodic power supply signal, determining a first signal waveform in a first time interval within a first period of the power supply signal, determining a second signal waveform in a second time interval within a second period of the power supply signal, the second time interval being at a position within the second period corresponding to a position of the first time interval within the first period, comparing the second signal waveform with a reference signal waveform to obtain a first comparison result, determining that the first comparison result corresponds to a given first comparison result, and in response, time-shifting one of the second signal waveform and the reference signal waveform, and comparing the time-shifted signal waveform with the non-time-shifted signal waveform to obtain a second comparison result.

Abstract: Methods, apparatus and systems for detecting an arc during supplying a plasma process in a plasma chamber with a power are provided. An example plasma power supply includes: a DC source, an output signal generator, a first signal sequence measurement device for measuring a first signal sequence present between the DC source and the output signal generator, a second signal sequence measurement device for measuring a second signal sequence present at an output of the output signal generator, and a controller configured to generate a reference signal sequence based on one of the first and second signal sequences, to compare the reference signal sequence and the other of the first and second signal sequences that has not been used to determine the reference signal sequence, and to generate a detection signal if the reference signal sequence and the other of the first and second signal sequences cross.

Abstract: Systems and methods of monitoring a discharge in a plasma process are disclosed. The methods include supplying the plasma process with a periodic power supply signal, determining a first signal waveform in a first time interval within a first period of the power supply signal, determining a second signal waveform in a second time interval within a second period of the power supply signal, the second time interval being at a position within the second period corresponding to a position of the first time interval within the first period, comparing the second signal waveform with a reference signal waveform to obtain a first comparison result, determining that the first comparison result corresponds to a given first comparison result, and in response, time-shifting one of the second signal waveform and the reference signal waveform, and comparing the time-shifted signal waveform with the non-time-shifted signal waveform to obtain a second comparison result.