Patents by Inventor Andy Fan

Andy Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10768185
    Abstract: Disclosed herein are antibodies capable of specifically binding to tenofovir (TFV), a key small molecule drug for both the treatment and prevention of HIV, and a competitive lateral flow assay that uses these antibodies to monitor urine samples for the presence of the drug. The assay can be deployed as a point-of-care device for adherence monitoring.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: September 8, 2020
    Assignee: TRUSTEES OF BOSTON UNIVERSITY
    Inventors: Catherine M. Klapperich, George Woodman Pratt, IV, Andy Fan
  • Publication number: 20190025334
    Abstract: Disclosed herein are antibodies capable of specifically binding to tenofovir (TFV), a key small molecule drug for both the treatment and prevention of HIV, and a competitive lateral flow assay that uses these antibodies to monitor urine samples for the presence of the drug. The assay can be deployed as a point-of-care device for adherence monitoring.
    Type: Application
    Filed: July 20, 2018
    Publication date: January 24, 2019
    Applicant: TRUSTEES OF BOSTON UNIVERSITY
    Inventors: Catherine M. Klapperich, George Woodman Pratt IV, Andy Fan
  • Patent number: 9863552
    Abstract: A fluid valve with a single shaft-sealing module is disclosed. The single shaft-sealing module allows the annular shaft sealing rings to be squeezed to slightly deform to prevent gaps being formed between the shaft and the inner surface of the valve body, and facilitates easy clean and/or replacement of the worn shaft sealing rings.
    Type: Grant
    Filed: August 24, 2016
    Date of Patent: January 9, 2018
    Assignee: JDV Control Valves Co., Ltd.
    Inventor: Andy Fan
  • Publication number: 20160363237
    Abstract: A fluid valve with a single shaft-sealing module is disclosed. The single shaft-sealing module allows the annular shaft sealing rings to be squeezed to slightly deform to prevent gaps being formed between the shaft and the inner surface of the valve body, and facilitates easy clean and/or replacement of the worn shaft sealing rings.
    Type: Application
    Filed: August 24, 2016
    Publication date: December 15, 2016
    Inventor: Andy Fan
  • Publication number: 20150369389
    Abstract: A fluid valve includes a valve body, a shaft and a valve disc. A shaft seal groove and a valve disc groove, which are in communication with each other, are provided in the valve body. The valve disc is disposed in the valve disc groove. A modular shaft sealing structure is provided in the shaft seal groove, and formed by sequentially stacked shaft seal rings, shaft rings and spring. The inner sides of these components are combined to be an accommodating space, in which the shaft is allowed to be accommodated. The modular shaft sealing structure of the present invention may be detachable, and can be integrally replaced, enabling more convenient replacement of components in the shaft sealing structure, so that the loads on the entire shaft sealing structure can be balanced.
    Type: Application
    Filed: November 14, 2014
    Publication date: December 24, 2015
    Inventor: Andy FAN
  • Publication number: 20150369388
    Abstract: A fluid valve includes a valve body, a shaft and a valve disc. A shaft seal groove and a valve disc groove, which are in communication with each other, are provided in the valve body. The valve disc is disposed in the valve disc groove. A modular shaft sealing structure is provided in the shaft seal groove, and formed by sequentially stacked shaft seal rings, shaft rings and spring. The inner sides of these components are combined to be an accommodating space, in which the shaft is allowed to be accommodated. The modular shaft sealing structure of the present invention may be detachable, and can be integrally replaced, enabling more convenient replacement of components in the shaft sealing structure, so that the loads on the entire shaft sealing structure can be balanced.
    Type: Application
    Filed: November 13, 2014
    Publication date: December 24, 2015
    Inventor: Andy Fan
  • Publication number: 20120316075
    Abstract: The present invention relates to a method for conversion of a target nucleic acid molecule according to a predetermined nucleotide code into a converted nucleic acid molecule. The converted nucleic acid molecule has utility for determining the nucleotide sequence of the target nucleic acid molecule, for example, using a nanopore.
    Type: Application
    Filed: March 30, 2012
    Publication date: December 13, 2012
    Applicant: NOBLEGEN BIOSCIENCES, INC.
    Inventors: Philip R. BUZBY, Amit MELLER, Benjamin MCNALLY, Andy FAN, Edyta OLEJNIK-KRZYNMANSKA
  • Publication number: 20080064183
    Abstract: A method of forming a multi-layer semiconductor structure includes attaching a handle-member to a top surface of a first structure using a first interface. At least one region of a bottom surface of the first structure is etched to form at least a first via-hole for exposing a portion of a first conductive member defined on the first structure. A conductive material is disposed in the first via-hole such that a first end of the conductive material is in electrical communication with the first conductive member and a second end of the conductive material is exposed at the bottom surface of the first structure. A second interface is disposed over at least the second end of the conductive material, which serves as a bonding and/or electrical interface between the first conductive member defined on the first structure and a second structure of the multi-layer semiconductor device structure.
    Type: Application
    Filed: November 8, 2007
    Publication date: March 13, 2008
    Inventors: Rafael Reif, Kuan-Neng Chen, Chuan Tan, Andy Fan
  • Patent number: 7307003
    Abstract: A method of forming a multi-layer semiconductor structure includes attaching a handle-member to a top surface of a first structure using a first interface. At least one region of a bottom surface of the first structure is etched to form at least a first via-hole for exposing a portion of a first conductive member defined on the first structure. A conductive material is disposed in the first via-hole such that a first end of the conductive material is in electrical communication with the first conductive member and a second end of the conductive material is exposed at the bottom surface of the first structure. A second interface is disposed over at least the second end of the conductive material, which serves as a bonding and/or electrical interface between the first conductive member defined on the first structure and a second structure of the multi-layer semiconductor device structure.
    Type: Grant
    Filed: December 30, 2003
    Date of Patent: December 11, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Rafael Reif, Kuan-Neng Chen, Chuan Seng Tan, Andy Fan
  • Patent number: 7064055
    Abstract: A method of forming a multi-layer semiconductor structure includes providing a first layer of a patterned copper bond film having a first predetermined thickness onto a first surface of a first semiconductor. The method further includes providing a second layer of a patterned copper bond film having a second predetermined thickness onto a first surface of a second semiconductor. The first and second semiconductor structures can be aligned, such that the first and second patterned copper bond films are disposed in proximity. A virtually seamless bond can be formed between the first and second patterned copper bond films to provide the first and second semiconductors as the multi-layer semiconductor structure.
    Type: Grant
    Filed: September 5, 2003
    Date of Patent: June 20, 2006
    Assignee: Massachusetts Institute of Technology
    Inventors: Rafael Reif, Andy Fan
  • Publication number: 20060099796
    Abstract: A method of forming a multi-layer semiconductor structure includes providing a first layer of a patterned copper bond film having a first predetermined thickness onto a first surface of a first semiconductor. The method further includes providing a second layer of a patterned copper bond film having a second predetermined thickness onto a first surface of a second semiconductor. The first and second semiconductor structures can be aligned, such that the first and second patterned copper bond films are disposed in proximity. A virtually seam-less bond can be formed between the first and second patterned copper bond films to provide the first and second semiconductors as the multi-layer semiconductor structure.
    Type: Application
    Filed: December 20, 2005
    Publication date: May 11, 2006
    Inventors: Rafael Reif, Andy Fan
  • Publication number: 20040219765
    Abstract: A method of forming a multi-layer semiconductor structure includes attaching a handle-member to a top surface of a first structure using a first interface. At least one region of a bottom surface of the first structure is etched to form at least a first via-hole for exposing a portion of a first conductive member defined on the first structure. A conductive material is disposed in the first via-hole such that a first end of the conductive material is in electrical communication with the first conductive member and a second end of the conductive material is exposed at the bottom surface of the first structure. A second interface is disposed over at least the second end of the conductive material, which serves as a bonding and/or electrical interface between the first conductive member defined on the first structure and a second structure of the multi-layer semiconductor device structure.
    Type: Application
    Filed: December 30, 2003
    Publication date: November 4, 2004
    Inventors: Rafael Reif, Kuan-Neng Chen, Chuan Sang Tan, Andy Fan
  • Publication number: 20040124538
    Abstract: A multi-layer integrated semiconductor structure including a first device layer having a first plurality of semiconductor elements. A first insulating layer is disposed over the first device layer and includes at least a first via-hole. A first conductive plug is disposed in the first via-hole. An interface portion is disposed over at least the first conductive plug. The multi-layer integrated semiconductor structure further includes a second device layer. The second device layer includes a second plurality of semiconductor elements disposed on a top surface of a substrate, which includes a second via-hole. A second conductive plug is disposed in the second via-hole. The second device layer is aligned and coupled to the first device layer via the interface portion so that the interface portion provides a communication relationship between the first device layer and the second device layer.
    Type: Application
    Filed: September 5, 2003
    Publication date: July 1, 2004
    Inventors: Rafael Reif, Shamik Das, Andy Fan
  • Publication number: 20040126994
    Abstract: A method of forming a multi-layer semiconductor structure includes providing a first layer of a patterned copper bond film having a first predetermined thickness onto a first surface of a first semiconductor. The method further includes providing a second layer of a patterned copper bond film having a second predetermined thickness onto a first surface of a second semiconductor. The first and second semiconductor structures can be aligned, such that the first and second patterned copper bond films are disposed in proximity. A virtually seam-less bond can be formed between the first and second patterned copper bond films to provide the first and second semiconductors as the multi-layer semiconductor structure.
    Type: Application
    Filed: September 5, 2003
    Publication date: July 1, 2004
    Inventors: Rafael Reif, Andy Fan