Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

Abstract: A razor blade cartridge having at least one razor blade and a housing made from a polymer material and having an outer surface where at least part of the outer surface of the housing is coated with a hydrophilic material, and where the outer surface of the housing includes undulations on at least a portion of the coated part.

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

Abstract: The disclosure is directed to providing high resolution stereoscopy with extended depth of focus. Wave front coding in optical paths going to a first detector and at least a second detector may be implemented to affect an intermediate set of images. The intermediate set of images may be filtered (i.e. decoded) to produce a filtered set of images with selected resolution and depth of focus properties. A first filtered image and a second filtered image may be substantially simultaneously presented to respective first and second eyes of an observer to further generate an illusion of enhanced depth (i.e. 3D perception).

Abstract: A transportable test system having a control room module, a first IMR test module, and a second IMR test module. The test modules may have fasteners that permit assembly into a unitary package of predetermined overall dimension (i.e. size and shape) such as a standard shipping container dimension. A first IMR test module may have a clean fluid provider and/or supply reservoir, and a second IMR test module may have a used fluid collector and/or collection reservoir. The system may include pressurization, hose restraint, fluid containment, module stabilization/mobilization, lifting, cleaning, and control subsystems.

Abstract: A razor blade cartridge having at least one razor blade and a housing made from a polymer material and having an outer surface where at least part of the outer surface of the housing is coated with a hydrophilic material, and where the outer surface of the housing includes undulations on at least a portion of the coated part.

Abstract: An apparatus (1) and a method for the three dimensional inspection of saw marks (2) on at least one surface (3) of a wafer (4) are disclosed. At least one camera (6) is required to capture an image of the entire surface (3) of the wafer (4). At least one line projector (8) provides a light bundle (5), centered about a central beam axis (9). The line projector (8) is arranged such that the central beam axis (9) is at an acute angle (?) with regard to the plane (P) of the wafer (4). A line shifter (12) is positioned in the light bundle (5) between each line projector (8) and the surface (3) of the wafer (4). A frame grabber (14) and an image processor (16) are used to synchronize and coordinate the image capture and the position of the pattern (20) of lines (22) on the front side (3F) and/or the back side (3B) of the wafer (4).

Abstract: An apparatus (1) and a method for the three dimensional inspection of saw marks (2) on at least one surface (3) of a wafer (4) are disclosed. At least one camera (6) is required to capture an image of the entire surface (3) of the wafer (4). At least one line projector (8) provides a light bundle (5), centered about a central beam axis (9). The line projector (8) is arranged such that the central beam axis (9) is at an acute angle (?) with regard to the plane (P) of the wafer (4). A line shifter (12) is positioned in the light bundle (5) between each line projector (8) and the surface (3) of the wafer (4). A frame grabber (14) and an image processor (16) are used to synchronize and coordinate the image capture and the position of the pattern (20) of lines (22) on the front side (3F) and/or the back side (3B) of the wafer (4).

Abstract: A transportable test system having a control room module, a first IMR test module, and a second IMR test module. The test modules may have fasteners that permit assembly into a unitary package of predetermined overall dimension (i.e. size and shape) such as a standard shipping container dimension. A first IMR test module may have a clean fluid provider and/or supply reservoir, and a second IMR test module may have a used fluid collector and/or collection reservoir. The system may include pressurization, hose restraint, fluid containment, module stabilization/mobilization, lifting, cleaning, and control subsystems.

Abstract: A protective suppression system including one or more sleeves of expansion coil of energy-absorbing material wrapped around a hose and a blanket which can be wrapped loosely around the wrapped hose. The longitudinal edges of the blanket fasten together to form a protective cylindrical tube, and can be joined end-to-end with one or more additional blankets to extend the protective tube to a desired total length. The system thus can provide improved safety to personnel and the environment by shielding a hose under pressure to suppress bursts, block leaks and by redirecting or channeling test fluids and cleaning fluids.

Abstract: A ring light illuminator with annularly arranged light sources is disclosed. To each light source there corresponds a beam shaper comprising a light collector, a homogenizing means for light from the light source, and an imaging means for imaging an output of the homogenizing means into an area to be illuminated. The homogenizing means in embodiments is a rod, into which light from the light collector is directed. The end of the rod opposite the light collector is imaged by the imaging means into the area to be illuminated.

Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.

Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.

Abstract: A system for and method of tracking a loan from a pool of assets is presented. The pool of assets may be legally owned by a single entity, but with separate individual investors owning an economic beneficial interest in a portion of the pool. The system and method provide a technique that allows for tax transparency for income generated by loans of such individual investor's associated assets. Moreover, the system and method allow for the separate individual investors to be domiciled in different tax jurisdictions.

Abstract: An apparatus (1) and a method for the three dimensional inspection of saw marks (2) on at least one surface (3) of a wafer (4) are disclosed. At least one camera (6) is required to capture an image of the entire surface (3) of the wafer (4). At least one line projector (8) provides a light bundle (5), centered about a central beam axis (9). The line projector (8) is arranged such that the central beam axis (9) is at an acute angle (?) with regard to the plane (P) of the wafer (4). A line shifter (12) is positioned in the light bundle (5) between each line projector (8) and the surface (3) of the wafer (4). A frame grabber (14) and an image processor (16) are used to synchronize and coordinate the image capture and the position of the pattern (20) of lines (22) on the front side (3F) and/or the back side (3B) of the wafer (4).

Abstract: A fuel processing system for heavier sulfur-laden hydrocarbon fuels, such as JP-8 and diesel fuels, having a fuel processor in which the sulfur-laden hydrocarbon fuels are reformed using steam reforming, an integrated desulfurization/methanation unit, and a solid oxide fuel cell. The heart of the system is the desulfurization/methanation unit which has a first reactor vessel and a second reactor vessel disposed within the first reactor vessel, forming an enclosed reaction space between the first reactor vessel and the second reactor vessel. A methanation catalyst is provided in the enclosed reaction space or the second reactor vessel. A desulfurization material is provided in the other of the enclosed reaction space and the second reactor vessel. During the normal course of operation, the desulfurization material will reach a saturation point at which it is no longer able to adsorb the sulfur-containing compounds.

Abstract: A liquid droplet ejecting device suitable for ejecting a droplet from a substrate onto a support at a distance greater than usual. A liquid droplet ejecting head that includes a plurality of actuating chambers is linked to a single common ejection nozzle through which a droplet is to be ejected from the head.

Abstract: A ring light illuminator with annularly arranged light sources is disclosed. To each light source there corresponds a beam shaper comprising a light collector, a homogenizing means for light from the light source, and an imaging means for imaging an output of the homogenizing means into an area to be illuminated. The homogenizing means in embodiments is a rod, into which light from the light collector is directed. The end of the rod opposite the light collector is imaged by the imaging means into the area to be illuminated.