Patents by Inventor Aneesh Khullar
Aneesh Khullar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200393477Abstract: Disclosed are apparatuses, systems, and methods for processing materials, including biological or chemical materials. A manufacturing module may include a work station configured to perform a process involving equipment capable of use with biological or chemical material, a first transportation segment that is configured to connect and disconnect with a second transportation segment such that when connected, a carrier of the biological or chemical material can be transported from the first transportation segment to the second transportation segment, a pick and place robot configured to move an element between the first transportation segment and the work station; and a movement mechanism configured to allow the work station, the first transportation segment, and the pick and place robot to be moved as a single unit. A system may include a plurality of manufacturing modules that are reconfigurable to a plurality of configurations.Type: ApplicationFiled: May 23, 2019Publication date: December 17, 2020Applicant: Zymergen Inc.Inventors: Jay S. Davey, Matthew Jonathan Myers, William Serber, Aneesh Khullar, Christopher James Bremner, David J. McLoughlin
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Patent number: 8126255Abstract: Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.Type: GrantFiled: September 19, 2008Date of Patent: February 28, 2012Assignee: KLA-Tencor Corp.Inventors: Kris Bhaskar, Chetana Bhaskar, Ashok Kulkarni, Eliezer Rosengaus, Cecelia Campochiaro, Chris Maher, Brian Duffy, Aneesh Khullar, Alpa Kohli, Lalita A. Balasubramanian, Santosh Bhattacharyya, Mohan Mahadevan
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Patent number: 8020750Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and may be partially integrated or fully integrated into a processing chamber which also includes diffusion bonded layers.Type: GrantFiled: October 24, 2006Date of Patent: September 20, 2011Assignee: Applied Materials, Inc.Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
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Patent number: 8017028Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: GrantFiled: October 14, 2008Date of Patent: September 13, 2011Assignee: Applied Materials, Inc.Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
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Patent number: 7984891Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: GrantFiled: April 20, 2007Date of Patent: July 26, 2011Assignee: Applied Materials, Inc.Inventors: Mark Crockett, John W. Lane, Michael J. DeChellis, Chris Melcer, Erica R. Porras, Aneesh Khullar, Balarabe N. Mohammed
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Patent number: 7850786Abstract: Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded. Subsequent to diffusion bonding, a stainless steel diffusion bonded part may advantageously be treated to enhance corrosion resistance using a series of steps designed to bring more chromium to the surface of the steel.Type: GrantFiled: October 17, 2006Date of Patent: December 14, 2010Assignee: Applied Materials, Inc.Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
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Patent number: 7559527Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: GrantFiled: April 19, 2007Date of Patent: July 14, 2009Assignee: Applied Materials, Inc.Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
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Publication number: 20090080759Abstract: Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.Type: ApplicationFiled: September 19, 2008Publication date: March 26, 2009Applicant: KLA-TENCOR CORPORATIONInventors: Kris Bhaskar, Chetana Bhaskar, Ashok Kulkarni, Eliezer Rosengaus, Cecilia Campochiaro, Chris Maher, Brian Duffy, Aneesh Khullar, Alpa Kohli, Lalita A. Balasubramanian, Santosh Bhattacharyya, Mohan Mahadevan
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Publication number: 20090039057Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: ApplicationFiled: October 14, 2008Publication date: February 12, 2009Inventors: Mark Crockett, John W. Lane, Micahel J. DeChellis, Chris Melcer, Erica R. Porras, Aneesh Khullar, Balarabe N. Mohammed
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Patent number: 7459003Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention pertains to a diffusion bonded integrated fluid flow network architecture, which includes, in addition to a layered substrate containing fluid flow channels, an in-line filter and may include various fluid handling and monitoring components. The integrated fluid delivery system that is formed from a layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: GrantFiled: October 3, 2006Date of Patent: December 2, 2008Assignee: Applied Materials, Inc.Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
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Patent number: 7448276Abstract: A diffusion bonded space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The disclosure includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. A capacitive dual electrode pressure sensor which is integrated into a multilayered substrate is described. The pressure sensor may be used as a gage relative to atmospheric pressure if desired for a particular application.Type: GrantFiled: August 23, 2006Date of Patent: November 11, 2008Assignee: Applied Materials, Inc.Inventors: Mark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
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Publication number: 20070226973Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: ApplicationFiled: April 19, 2007Publication date: October 4, 2007Inventors: Mark Crockett, John Lane, Michael DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe Mohammed
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Publication number: 20070200082Abstract: The disclosure pertains to a space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The present invention also pertains to an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: ApplicationFiled: April 20, 2007Publication date: August 30, 2007Inventors: Mark Crockett, John Lane, Michael DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe Mohammed
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Publication number: 20070113663Abstract: The disclosure pertains to a space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The present invention also pertains to an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: ApplicationFiled: August 23, 2006Publication date: May 24, 2007Inventors: Mark Crockett, John Lane, Michael DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe Mohammed
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Publication number: 20070062909Abstract: Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded. Subsequent to diffusion bonding, a stainless steel diffusion bonded part may advantageously be treated to enhance corrosion resistance using a series of steps designed to bring more chromium to the surface of the steel.Type: ApplicationFiled: October 17, 2006Publication date: March 22, 2007Inventors: Mark Crockett, John Lane, Michael DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe Mohammed
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Publication number: 20070062021Abstract: The disclosure pertains to a space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The present invention also pertains to an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: ApplicationFiled: October 24, 2006Publication date: March 22, 2007Inventors: Mark Crockett, John Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe Mohammed
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Publication number: 20070051080Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention pertains to a diffusion bonded integrated fluid flow network architecture, which includes, in addition to a layered substrate containing fluid flow channels, an in-line filter and may include various fluid handling and monitoring components. The integrated fluid delivery system that is formed from a layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: ApplicationFiled: October 3, 2006Publication date: March 8, 2007Inventors: Mark Crockett, John Lane, Michael DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe Mohammed
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Publication number: 20040119038Abstract: The disclosure pertains to a space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The present invention also pertains to an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.Type: ApplicationFiled: July 12, 2003Publication date: June 24, 2004Applicant: Applied Materials, Inc.Inventors: Mark Crockett, John W. Lane, Michael J. DeChellis, Chris Melcer, Erica R. Porras, Aneesh Khullar, Balarabe N. Mohammed