Patents by Inventor Anette Lofstrand

Anette Lofstrand has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern replication with intermediate stamp
    Patent number: 7704425
    Abstract: The invention relates to a two-step process for transferring a pattern from a template (1) to a target surface of a substrate, by creating an intermediate flexible polymer stamp (5) from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: April 27, 2010
    Assignee: Obducat AB
    Inventors: Babak Heidari, Anette Löfstrand, Erik Bolmsjö, Erik Theander, Marc Beck
  • Pattern replication with intermediate stamp
    Publication number: 20060279025
    Abstract: The invention relates to a two-step process for transferring a pattern from a template (1) to a target surface of a substrate, by creating an intermediate flexible polymer stamp (5) from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.
    Type: Application
    Filed: November 8, 2005
    Publication date: December 14, 2006
    Inventors: Babak Heidari, Anette Lofstrand, Erik Bolmsjo, Erik Theander, Marc Beck