Abstract: An applicator for reducing the concentration of unwanted chemicals such as para-chloroaniline (PCA) from an antiseptic solution includes an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and at least one hydrophobic or hydrophilic material. The hydrophobic or hydrophilic material selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the hydrophobic or hydrophilic material. A method for selectively removing unwanted by-products from an antiseptic solution includes the steps of providing an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and contacting the antiseptic solution with at least one hydrophobic or hydrophilic material that selectively removes the unwanted by-products from the antiseptic solution.

Abstract: Applicators and a method for reducing the concentration of unwanted chemicals, such as para-chloroaniline (PCA) from an antiseptic solution. More specifically, the applicator includes antiseptic solution in amount sufficient to be applied to a desired surface and to have an antimicrobial effect on the desired surface and a porous element. The porous element selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the at least one porous element.

Abstract: The present invention relates generally to applicators and a method for reducing the concentration of unwanted chemicals, such as para-chloroaniline (PCA) from an antiseptic solution. More specifically, the applicator includes antiseptic solution in amount sufficient to be applied to a desired surface and to have an antimicrobial effect on the desired surface and a porous element. The porous element selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the at least one porous element.