Patents by Inventor Angela Duparre

Angela Duparre has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical Coating and Method for Producing an Optical Coating with Reduced Light Scattering
    Publication number: 20190086580
    Abstract: An optical coating and a method for producing an optical coating with reduced light scattering are disclosed. In an embodiment, an optical coating includes at least one scattering zone, wherein the scattering zone is arranged on a surface of the optical coating, wherein an electric field strength of the electromagnetic radiation has a minimum in the scattering zone in order to reduce scattering of the electromagnetic radiation, and wherein the electric field strength has the minimum above the surface of an uppermost layer of the optical coating.
    Type: Application
    Filed: February 24, 2017
    Publication date: March 21, 2019
    Inventors: Alexander von Finck, Sven Schröder, Steffen Wilbrandt, Olaf Stenzel, Angela Duparre, Gunther Notni
  • Substrate with a reduced light-scattering, ultraphobic surface and method for the production of the same
    Publication number: 20060159934
    Abstract: The Invention relates to a substrate with a reduced light-scattering, ultraphobic surface, to a method for the production of said substrate and to the use thereof. The substrate with a reduced light-scattering, ultraphobic surface has a total scatter loss ?7%, preferably ?3% and especially ?1% and a contact angle in relation to water of ?140°, preferably ?150°.
    Type: Application
    Filed: March 16, 2006
    Publication date: July 20, 2006
    Applicant: SUNYX SURFACE NANOTECHNOLOGIES GMBH
    Inventors: Karsten Reihs, Angela Duparre, Gunther Notni
  • Substrate with a reduced light-scattering, ultraphobic surface and method for the production of the same
    Publication number: 20030124360
    Abstract: The invention relates to a substrate with a reduced light-scattering, ultraphobic surface, to a method for the production of said substrate and to the use thereof. The substrate with a reduced light-scattering, ultraphobic surface has a total scatter loss ≦7%, preferably ≦3% and especially ≦1% and a contact angle in relation to water of ≧140°, preferably ≧150°.
    Type: Application
    Filed: November 26, 2002
    Publication date: July 3, 2003
    Inventors: Karsten Reihs, Angela Duparre, Gunther Notni