Patents by Inventor Angela Kwapong

Angela Kwapong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical mechanical planarization slurry and method for forming same
    Patent number: 10329455
    Abstract: A CMP slurry including a carrier, a particulate material within the carrier including an oxide, carbide, nitride, boride, diamond or any combination thereof, an oxidizer including at least one material selected from the group of peroxides, persulfates, permanganates, periodates, perchlorates, hypocholorites, iodates, peroxymonosulfates, cerric ammonium nitrate, periodic acid, ferricyanides, or any combination thereof, and a material removal rate index (MRR) of at least 500 nm/hr and an average roughness index (Ra) of not greater than 5 Angstroms according to the Standardized Polishing test.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: June 25, 2019
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Ian T. Sines, Angela Kwapong, Carlijn L. Mulder, Douglas E. Ward, Vianney Le Roux
  • CHEMICAL MECHANICAL PLANARIZATION SLURRY AND METHOD FOR FORMING SAME
    Publication number: 20180086944
    Abstract: A CMP slurry including a carrier, a particulate material within the carrier including an oxide, carbide, nitride, boride, diamond or any combination thereof, an oxidizer including at least one material selected from the group of peroxides, persulfates, permanganates, periodates, perchlorates, hypocholorites, iodates, peroxymonosulfates, cerric ammonium nitrate, periodic acid, ferricyanides, or any combination thereof, and a material removal rate index (MRR) of at least 500 nm/hr and an average roughness index (Ra) of not greater than 5 Angstroms according to the Standardized Polishing test.
    Type: Application
    Filed: September 21, 2017
    Publication date: March 29, 2018
    Inventors: Ian T. Sines, Angela Kwapong, Carlijn L. Mulder, Douglas E. Ward, Vianney Le Roux