Patents by Inventor Angela R. Sico

Angela R. Sico has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas systems and methods for chamber ports
    Patent number: 10381247
    Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.
    Type: Grant
    Filed: August 16, 2016
    Date of Patent: August 13, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Nagendra V. Madiwal, Robert Irwin Decottignies, Andrew Nguyen, Paul B. Reuter, Angela R. Sico, Michael Kuchar, Travis Morey, Mitchell DiSanto
  • GAS SYSTEMS AND METHODS FOR CHAMBER PORTS
    Publication number: 20160358792
    Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.
    Type: Application
    Filed: August 16, 2016
    Publication date: December 8, 2016
    Inventors: Nagendra V. Madiwal, Robert Irwin Decottignies, Andrew Nguyen, Paul B. Reuter, Angela R. Sico, Michael Kuchar, Travis Morey, Mitchell DiSanto
  • Gas apparatus, systems, and methods for chamber ports
    Patent number: 9435025
    Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: September 6, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Nagendra V. Madiwal, Robert Irwin Decottignies, Andrew Nguyen, Paul B. Reuter, Angela R. Sico, Michael Kuchar, Travis Morey, Mitchell Disanto
  • GAS APPARATUS, SYSTEMS, AND METHODS FOR CHAMBER PORTS
    Publication number: 20150083330
    Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.
    Type: Application
    Filed: September 25, 2013
    Publication date: March 26, 2015
    Inventors: Nagendra V. Madiwal, Robert Irwin Decottignies, Andrew Nguyen, Paul B. Reuter, Angela R. Sico, Michael Kuchar, Travis Morey, Mitchell Disanto