Patents by Inventor Angelika Bruns

Angelika Bruns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a mask for radiation lithography
    Patent number: 4946751
    Abstract: A method is set forth of manufacturing a mask for radiation lithography having a mask support and a substrate, on which an absorber layer is provided to be structured according to a desired mask pattern. The absorber layer having a thickness preferably in the range of from 0.2 to 1.2 .mu.m of partly oxidized tungsten having an oxygen content in the range of from 21 to 29 at. % in the layer is deposited on the substrate, preferably by means of cathode sputtering.
    Type: Grant
    Filed: August 31, 1988
    Date of Patent: August 7, 1990
    Assignee: U.S. Philips Corporation
    Inventors: Angelika Bruns, Waldemar Gotze, Margret Harms, Holger Luthje
  • Mask for the formation of patterns in lacquer layers by means of X-ray lithography and method of manufacturing same
    Patent number: 4555460
    Abstract: In a mask for X-ray lithography, in which a pattern of a layer corresponding to the structure to be manufactured and consisting of a material opaque to visible light is applied to a thin diaphragm of a material transparent to X-ray radiation, an adjustment with visible radiation, such as laser light, is made possible using a diaphragm consisting of a material opaque to visible light and using adjustment windows of a material transparent to the visible light of the spectrum through the diaphragm.
    Type: Grant
    Filed: August 31, 1983
    Date of Patent: November 26, 1985
    Assignee: U.S. Philips Corporation
    Inventors: Margret Harms, Angelika Bruns, Holger Luthje, Bernd Matthiessen