Abstract: A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The apparatus has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.

Abstract: For the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments—especially radicals or ions—are produced by ultraviolet radiation; the ultraviolet radiation is performed by at least one ultraviolet radiator disposed at a given distance, with a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, which is provided on the side facing away from the discharge chamber with at least one electrode; during the irradiation a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated.

Abstract: A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The radiator has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.

Abstract: An object with a homogeneous matted surface is provided which can be carried out in a simple manner and at low cost. The surface of the object has a thin skin layer produced by UV polymerization at a wavelength of at most 200 nm, and a core or carrier layer, beneath the skin layer, is produced by polymerization with UV radiation of a wavelength of at least 220 nm or by electron beams. A method for producing the matted surface is also provided, wherein a film made of an organic material that can be polymerized by UV radiation or electron beams is applied to a substrate; the film is irradiated with UV radiation of a wavelength of at most 200 nm, with the production of the skin layer at the surface, in which the organic material is at least partially polymerized; and the core area of the film, beneath the skin layer, is irradiated with UV radiation having a wavelength above 220 nm or by electron beams.