Patents by Inventor Angelo W. Kandas

Angelo W. Kandas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern-sensitive deposition for damascene processing
    Patent number: 6406995
    Abstract: A method of forming an interconnection including the steps of forming a sacrificial material that comprises a physical property that is generally insensitive to a photo-reaction in a via through a dielectric material to a masking material over a conductive material. The method also includes forming a trench over in the dielectric material over the via and removing the sacrificial material from the via.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: June 18, 2002
    Assignee: Intel Corporation
    Inventors: Makarem A. Hussein, Alan M. Myers, Charles H. Recchia, Sam Sivakumar, Angelo W. Kandas