Patents by Inventor Anger Pascal

Anger Pascal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9653254
    Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: May 16, 2017
    Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL LTD.
    Inventors: Dirk Zeidler, Thomas Kemen, Anger Pascal, Antonio Casares, Christof Riedesel
  • Publication number: 20160155603
    Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a easier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system.
    Type: Application
    Filed: February 5, 2016
    Publication date: June 2, 2016
    Inventors: Dirk Zeidler, Thomas KEMEN, Anger Pascal, Antonio Casares, Christof Riedesel