Abstract: A system for preventing collisions between components in a particle beam instrument is disclosed. The system is particularly beneficial in use with instruments wherein moveable components are used within a chamber that obscures them from being viewed from outside the chamber. The system comprises: a capacitance sensor configured to monitor the capacitance between a first component and a second component of the instrument, and a proximity module configured to: derive a capacitance parameter from the monitored capacitance between the first component and the second component; and output a proximity alert signal in accordance with a comparison between the derived capacitance parameter and a predetermined capacitance parameter threshold value.

Abstract: An apparatus for detecting Kikuchi diffraction patterns is provided. The apparatus comprises: an electron column adapted in use to provide an electron beam directed towards a sample, the electron beam having an energy in the range 2 keV to 50 keV, and; an imaging detector for receiving and counting electrons from the sample due to interaction of the electron beam with the sample, the detector comprising an array of pixels and having a count rate capability of at least 2,000 electrons per second for each pixel, wherein: the imaging detector is adapted to provide electronic energy filtering of the received electrons in order to count the received electrons which are representative of the said diffraction pattern, and the particle detector has an inert layer on the surface where the electrons enter towards the active region of the detector, wherein the inert layer disperses the detected energy of 20 keV incident electrons with an energy spread having a full-width half maximum less than 3.2 keV.

Abstract: A method and system for processing a diffraction pattern image obtained in an electron microscope are disclosed.

Abstract: A system for preventing collisions between components in a particle beam instrument is disclosed. The system is particularly beneficial in use with instruments wherein moveable components are used within a chamber that obscures them from being viewed from outside the chamber. The system comprises: a capacitance sensor configured to monitor the capacitance between a first component and a second component of the instrument, and a proximity module configured to: derive a capacitance parameter from the monitored capacitance between the first component and the second component; and output a proximity alert signal in accordance with a comparison between the derived capacitance parameter and a predetermined capacitance parameter threshold value.

Abstract: A system for preventing collisions between components in a particle beam instrument is disclosed. The system is particularly beneficial in use with instruments wherein moveable components are used within a chamber that obscures them from being viewed from outside the chamber. The system comprises: a capacitance sensor configured to monitor the capacitance between a first component and a second component of the instrument, and a proximity module configured to: derive a capacitance parameter from the monitored capacitance between the first component and the second component; and output a proximity alert signal in accordance with a comparison between the derived capacitance parameter and a predetermined capacitance parameter threshold value.

Abstract: A method and system for processing a diffraction pattern image obtained in an electron microscope are disclosed.

Abstract: A system for preventing collisions between components in a particle beam instrument is disclosed. The system is particularly beneficial in use with instruments wherein moveable components are used within a chamber that obscures them from being viewed from outside the chamber. The system comprises: a capacitance sensor configured to monitor the capacitance between a first component and a second component of the instrument, and a proximity module configured to: derive a capacitance parameter from the monitored capacitance between the first component and the second component; and output a proximity alert signal in accordance with a comparison between the derived capacitance parameter and a predetermined capacitance parameter threshold value.

Abstract: An apparatus for detecting one or each of Kikuchi and Kossel diffraction patterns is provided. The apparatus comprises an electron column adapted in use to provide an electron beam (101) directed to wards a sample (102), the electron beam (101) having an energy in the range 2 keV to 50 keV, and a particle detector (111) for receiving and counting particles (103) from the sample (102) due to interaction of the electron beam (101) with the sample (102), the detector comprising an array of pixels (109) and having a count rate capability of at least 1000 particles per second for each pixel. The particle detector (111) is further adapted to provide electronic energy filtering of the received particles in order to count the received particles which are representative of the said diffraction pattern.

Abstract: An apparatus for detecting one or each of Kikuchi and Kossel diffraction patterns is provided. The apparatus comprises an electron column adapted in use to provide an electron beam (101) directed to wards a sample (102), the electron beam (101) having an energy in the range 2 keV to 50 keV, and a particle detector (111) for receiving and counting particles (103) from the sample (102) due to interaction of the electron beam (101) with the sample (102), the detector comprising an array of pixels (109) and having a count rate capability of at least 1000 particles per second for each pixel. The particle detector (111) is further adapted to provide electronic energy filtering of the received particles in order to count the received particles which are representative of the said diffraction pattern.

Abstract: An x-ray analyser for a transmission electron microscope is described. The analyser has a silicon drift detector moveable in use between an analysis position and a retracted position. The analyser has a housing having an end portion within which the silicon drift detector is retained. The end portion is formed from a material with a relative magnetic permeability of less than 1.004. The analyser also has an automatic retraction system adapted to move the silicon drift detector from the analysis position to the retracted position upon receipt of a trigger signal indicative of a condition in which the power level received by the silicon drift detector from impinging x-rays or electrons is above a predetermined threshold.

Abstract: A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed from one or more magnets positioned around the bore in a Halbach configuration thereby generating a relatively high magnetic field strength within the bore and a relatively low magnetic field strength outside of the deflector. The deflector has a geometry defining an outer surface and an inner surface, wherein each of the outer and inner surfaces of the deflector taper towards the axis as a respective function of distance in the specimen direction along the axis.

Abstract: A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed from one or more magnets positioned around the bore in a Halbach configuration thereby generating a relatively high magnetic field strength within the bore and a relatively low magnetic field strength outside of the deflector. The deflector has a geometry defining an outer surface and an inner surface, wherein each of the outer and inner surfaces of the deflector taper towards the axis as a respective function of distance in the specimen direction along the axis.

Abstract: An electron microscope 10 is adapted to enable spectroscopic analysis of a sample 16. A parabolic mirror 18 has a central aperture 20 through which the electron beam can pass. The mirror 18 focuses laser illumination from a transverse optical path 24 onto the sample, and collects Raman and/or other scattered light, passing it back to an optical system 30. The mirror 18 is retractable (within the vacuum of the electron microscope) by a sliding arm assembly 22.

Abstract: An electron microscope 10 is adapted to enable spectroscopic analysis of a sample 16. A parabolic mirror 18 has a central aperture 20 through which the electron beam can pass. The mirror 18 focuses laser illumination from a transverse optical path 24 onto the sample, and collects Raman and/or other scattered light, passing it back to an optical system 30. The mirror 18 is retractable (within the vacuum of the electron microscope) by a sliding arm assembly 22.