Patents by Inventor Anish Bekal

Anish Bekal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10823671
    Abstract: One or more light sources emit light within first, second, and third wavelength ranges through exhaust gas. The first and second wavelength ranges are characterized by first and second different absorption wavelength ranges of a background gas. The third wavelength range is characterized by an absorption wavelength range of a gas-of-interest. At least some of the light within the first, second, and third wavelength ranges is absorbed by the exhaust gas thereby providing modified light characterized by the first, second, and third absorption wavelength ranges. One or more detectors receive the modified light. A processing subsystem determines a temperature of the exhaust gas based on the modified light characterized by the first and second absorption wavelength ranges and a concentration of the gas-of-interest based on the modified light characterized by the third absorption wavelength range and the temperature of the exhaust gas.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: November 3, 2020
    Assignee: General Electric Company
    Inventors: Rachit Sharma, David Kelly Moyeda, Chayan Mitra, Arun Kumar Sridharan, Anish Bekal, Eric YuHang Fung
  • Patent number: 10613000
    Abstract: A method for determining a multi-dimensional profile of at least one emission parameter corresponding to an exhaust emission of a combustion process is presented. The method includes emitting a laser beam in a plurality of directions through the exhaust emission. The laser beam includes a plurality of wavelengths and the exhaust emission is characterized by the plurality of emission parameters. The method further includes detecting a plurality of absorption spectrum signals for each of the plurality of directions and determining a plurality of single-dimensional profiles corresponding to the at least one emission parameter. Each of the plurality of single-dimensional profiles is determined based on the plurality of absorption spectrum signals corresponding to each respective direction of the plurality of directions. The method also includes generating the multi-dimensional profile corresponding to the at least one emission parameter based on the plurality of single-dimensional profiles.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: April 7, 2020
    Assignee: General Electric Company
    Inventors: Samhitha Palanganda Poonacha, Anish Bekal, Rachit Sharma, Chayan Mitra, Eric YuHang Fung
  • Publication number: 20180259448
    Abstract: One or more light sources emit light within first, second, and third wavelength ranges through exhaust gas. The first and second wavelength ranges are characterized by first and second different absorption wavelength ranges of a background gas. The third wavelength range is characterized by an absorption wavelength range of a gas-of-interest. At least some of the light within the first, second, and third wavelength ranges is absorbed by the exhaust gas thereby providing modified light characterized by the first, second, and third absorption wavelength ranges. One or more detectors receive the modified light. A processing subsystem determines a temperature of the exhaust gas based on the modified light characterized by the first and second absorption wavelength ranges and a concentration of the gas-of-interest based on the modified light characterized by the third absorption wavelength range and the temperature of the exhaust gas.
    Type: Application
    Filed: December 22, 2015
    Publication date: September 13, 2018
    Applicant: General Electric Comany
    Inventors: Rachit SHARMA, David Kelly MOYEDA, Chayan MITRA, Arun Kumar SRIDHARAN, Anish BEKAL, Eric YuHang FUNG
  • Patent number: 10060796
    Abstract: A method for correcting frequency offset in a dual comb spectroscopy system is provided. The method includes causing a first laser (L1) generator to transmit L1 pulses at a repetition rate of a first frequency and causing a second laser (L2) generator to transmit L2 pulses at a repetition rate of a second frequency. The method also includes interrogating a reference material using a combination of the L1 pulses and the L2 pulses and capturing reference cell pulses. The method further includes interrogating a material of interest using the L1 pulses and capturing material of interest pulses. The method includes determining a frequency jitter based on the captured reference cell pulses and the combination of the captured material of interest pulses and the L2 pulses.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: August 28, 2018
    Assignee: MORPHO DETECTION, LLC
    Inventors: Anish Bekal, Sameer Dinkar Vartak, Rachit Sharma
  • Publication number: 20180172554
    Abstract: A method for determining a multi-dimensional profile of at least one emission parameter corresponding to an exhaust emission of a combustion process is presented. The method includes emitting a laser beam in a plurality of directions through the exhaust emission. The laser beam includes a plurality of wavelengths and the exhaust emission is characterized by the plurality of emission parameters. The method further includes detecting a plurality of absorption spectrum signals for each of the plurality of directions and determining a plurality of single-dimensional profiles corresponding to the at least one emission parameter. Each of the plurality of single-dimensional profiles is determined based on the plurality of absorption spectrum signals corresponding to each respective direction of the plurality of directions. The method also includes generating the multi-dimensional profile corresponding to the at least one emission parameter based on the plurality of single-dimensional profiles.
    Type: Application
    Filed: December 5, 2017
    Publication date: June 21, 2018
    Inventors: Samhitha PALANGANDA POONACHA, Anish BEKAL, Rachit SHARMA, Chayan MITRA, Eric YuHang FUNG
  • Publication number: 20170307443
    Abstract: A method for correcting frequency offset in a dual comb spectroscopy system is provided. The method includes causing a first laser (L1) generator to transmit L1 pulses at a repetition rate of a first frequency and causing a second laser (L2) generator to transmit L2 pulses at a repetition rate of a second frequency. The method also includes interrogating a reference material using a combination of the L1 pulses and the L2 pulses and capturing reference cell pulses. The method further includes interrogating a material of interest using the L1 pulses and capturing material of interest pulses. The method includes determining a frequency jitter based on the captured reference cell pulses and the combination of the captured material of interest pulses and the L2 pulses.
    Type: Application
    Filed: April 25, 2016
    Publication date: October 26, 2017
    Inventors: Anish Bekal, Sameer Dinkar Vartak, Rachit Sharma