Patents by Inventor Anita BOUMA

Anita BOUMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Tuning patterning apparatus based on optical characteristic
    Patent number: 11474436
    Abstract: A method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting an optical parameter associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: October 18, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Bart Smeets, Anita Bouma, Johannes Jacobus Matheus Baselmans, Birgitt Noelle Cornelia Liduine Hepp, Paulus Hubertus Petrus Koller, Carsten Andreas Köhler
  • TUNING PATTERNING APPARATUS BASED ON OPTICAL CHARACTERISTIC
    Publication number: 20210247698
    Abstract: A method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting an optical parameter associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.
    Type: Application
    Filed: June 11, 2019
    Publication date: August 12, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bart SMEETS, Anita BOUMA, Johannes Jacobus Matheus BASELMANS, Birgitt Noelle Cornelia Liduine HEPP, Paulus Hubertus Petrus KOLLER, Carsten Andreas KÖHLER