Patents by Inventor Anja Vanleenhove

Anja Vanleenhove has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithography
    Patent number: 8257912
    Abstract: The invention relates to a method of photolithography comprising the steps of: providing a substrate and forming a layer of a photoresist on the substrate, performing a first exposure in which a predetermined part of the layer of photoresist is irradiated through a mask having a pattern for forming a latent image of said pattern in the layer of the photoresist, performing a pretreatment on the layer of the photoresist to remove a predetermined part of the latent image before performing the fixation. The method provides an improved process window. The invention further relates to a photoresist for use within the method of the invention.
    Type: Grant
    Filed: July 31, 2007
    Date of Patent: September 4, 2012
    Assignee: NXP B.V.
    Inventors: Hans Kwinten, Peter Zandbergen, David Van Steenwinckel, Anja Vanleenhove