Patents by Inventor Anjali Anagol-Subbarao

Anjali Anagol-Subbarao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040221001
    Abstract: A system for providing web services to a client over a network includes an interface module in communication with the network, an implementation module in communication with the interface module, and a fulfillment module in communication with the implementation module and at least one database. The interface module receives the web service request from the client, passes the request to at least one other component of the system, and passes assimilated data to the client in response to the web service request. The implementation module assimilates data provided by at least one other component of the system in response to the service request. The fulfillment module extracts data from at least one database in response to the service request and provides the extracted data to the implementation module.
    Type: Application
    Filed: July 5, 2002
    Publication date: November 4, 2004
    Inventors: Anjali Anagol-Subbarao, Rajesh Pradhan
  • Publication number: 20040006571
    Abstract: An apparatus and method for a web service that produces a product catalog. In one embodiment according to the invention, a product catalog web service request is received from a client via a computer network. After the service request is received, client-specific data is extracted from a central product catalog database in response to the request. A custom product catalog is generated using the extracted data, and the custom product catalog is sent to the client via the computer network.
    Type: Application
    Filed: July 5, 2002
    Publication date: January 8, 2004
    Inventors: Anjali Anagol-Subbarao, Rajesh S. Pradhan
  • Publication number: 20040006610
    Abstract: An apparatus and method for a web service that validates a product configuration. In one embodiment, a configuration validation web service request is received from a client via a computer network. A central product catalog and a configurator database are invoked to determine if the product configuration is a valid configuration. A response is sent to the client via the computer network indicating if the product configuration is a valid configuration.
    Type: Application
    Filed: July 5, 2002
    Publication date: January 8, 2004
    Inventors: Anjali Anagol-Subbarao, Rajesh Pradhan
  • Publication number: 20040006516
    Abstract: An apparatus and method for a web service accepts an order for a configure-to-order product. In one embodiment according to the invention, a web service request to place a product order is received from a client via a computer network. The configuration of the ordered product is validated and the product order is placed into an order fulfillment database. An order confirmation is sent to the client via the computer network.
    Type: Application
    Filed: July 5, 2002
    Publication date: January 8, 2004
    Inventors: Anjali Anagol-Subbarao, Keoki Wai Hoong Young, Rajesh Pradhan
  • Patent number: 5482819
    Abstract: A photolithographic process for forming a lead frame pattern or other pattern is described. In the preferred embodiment, a mask approximately 12 inches by 12 inches contains two nearly identical patterns: a first lead frame pattern is provided on one half of the mask, and a second lead frame pattern, having features reduced by 0.3 mil, is provided on the other half of the mask. The first pattern is positioned over a copper web having a layer of photoresist laminated on it, and ultraviolet light is transmitted through the first pattern. The photoresist is thus exposed by a first image formed by the first pattern. While the copper web remains stationary, the mask is moved perpendicular to the length of the copper web so that the second pattern now forms a second image overlying the photoresist pattern from the first image. The photoresist layer is then exposed by the second image. The two nearly identical patterns on the mask essentially double expose the photoresist except for a 0.
    Type: Grant
    Filed: April 4, 1994
    Date of Patent: January 9, 1996
    Assignee: National Semiconductor Corporation
    Inventors: Eddy Tjhia, Chi Lin, Anjali Anagol-Subbarao