Patents by Inventor Anjan Prasad Gantapara

Anjan Prasad Gantapara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250060738
    Abstract: A method for training a diagnostic model for diagnosing a production system, wherein the production system includes a plurality of sub-systems. The diagnostic model includes, for each sub-system, a corresponding first learning model arranged to receive input data, and to generate compressed data for the production system in a corresponding compressed latent space. A second learning model is arranged to receive the compressed data generated by the first learning models, and generate further compressed data for the production system in a further compressed latent space. The method includes performing training of the first and second learning models based on training data derived from sensor data characterizing the sub-systems.
    Type: Application
    Filed: December 14, 2022
    Publication date: February 20, 2025
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Eleftherios KOULIERAKIS, Anjan Prasad GANTAPARA, Satej Subhash KHEDEKAR, Hamideh ROSTAMI
  • Patent number: 12204298
    Abstract: A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.
    Type: Grant
    Filed: February 4, 2021
    Date of Patent: January 21, 2025
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Carlo Lancia, Anjan Prasad Gantapara, Dirk-Jan Kernkamp, Seyed Iman Mossavat, Alexander Ypma
  • Publication number: 20230273529
    Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input includes one or more parameters used in the patterning process. The control output is generated with a trained machine learning mod& based on the control input, The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data, The training data includes 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.
    Type: Application
    Filed: June 14, 2021
    Publication date: August 31, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Satej Subhash KHEDEKAR, Henricus Jozef CASTELIJNS, Anjan Prasad GANTAPARA, Stephen Henry BOND, Seyed Iman MOSSAVAT, Alexander YPMA, Gerald DICKER, Ewout Klaas STEINMEIER, Chaoqun GUO, Chenxi LIN, Hongwei CHEN, Zhaoze LI, Youping ZHANG, Yi ZOU, Koos VAN BERKEL, Joost Johan BOLDER, Arnaud HUBAUX, Andriy Vasyliovich HLOD, Juan Manuel GONZALEZ HUESCA, Frans Bernard AARDEN
  • Publication number: 20230138469
    Abstract: A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.
    Type: Application
    Filed: February 4, 2021
    Publication date: May 4, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Carlo LANCIA, Anjan Prasad Gantapara, Dirk-Jan KERNKAMP, Seyed Iman MOSSAVAT, Alexander YPMA