Patents by Inventor Anko Jozef Cornelus Sijben

Anko Jozef Cornelus Sijben has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system and metrology system
    Patent number: 10416567
    Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: September 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Matheus Marie De Wit, Kim Gerard Feijen, Anko Jozef Cornelus Sijben, Martinus Maassen, Henricus Martinus Johannes Van De Groes
  • Illumination System and Metrology System
    Publication number: 20170255105
    Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.
    Type: Application
    Filed: February 27, 2017
    Publication date: September 7, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Matheus Marie DE WIT, Kim Gerard Feijen, Anko Jozef Cornelus Sijben, Martinus Maassen, Henricus Martinus Johannes VAN DE GROES
  • Chuck, a chuck control system, a lithography apparatus and a method of using a chuck
    Patent number: 9494875
    Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.
    Type: Grant
    Filed: September 19, 2012
    Date of Patent: November 15, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will
  • Electrostatic clamp, lithographic apparatus, and device manufacturing method
    Patent number: 9360771
    Abstract: An electrostatic clamp for use in holding an object onto a supporting table, the electrostatic clamp comprising: a multi-layer film comprising an electrode defined in an electrically conducting layer which is positioned between electrically insulating layers.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Eugene Maria Brinkhof, Jan Bex, Anko Jozef Cornelus Sijben, Johannes Wilhelmus Damen
  • Chuck, a Chuck Control System, a Lithography Apparatus and a Method of Using a Chuck
    Publication number: 20140253900
    Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.
    Type: Application
    Filed: September 19, 2012
    Publication date: September 11, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will
  • Electrostatic Clamp, Lithographic Apparatus, and Device Manufacturing Method
    Publication number: 20140218711
    Abstract: An electrostatic clamp for use in holding an object onto a supporting table, the electrostatic clamp comprising: a multi-layer film comprising an electrode defined in an electrically conducting layer which is positioned between electrically insulating layers.
    Type: Application
    Filed: February 7, 2012
    Publication date: August 7, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Eugene Maria Brinkhof, Jan Bex, Anko Jozef Cornelus Sijben, Johannes Wihelmus Damen
  • Lithographic apparatus and method
    Patent number: 8564763
    Abstract: A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
    Type: Grant
    Filed: May 6, 2009
    Date of Patent: October 22, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Frits Van der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens
  • SUPPORT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20130146785
    Abstract: A support for an object having a support surface configured to support the object; wherein the support surface includes a main part and a moveable part, the moveable part of the support surface being moveable between a retracted position in which the moveable part of the support surface is adapted to be substantially in the same plane as the main part of the support surface and an extended position in which the moveable part of the support surface protrudes from the plane of the main part of the support surface.
    Type: Application
    Filed: November 26, 2012
    Publication date: June 13, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Noud Jan GILISSEN, Martinus Agnes Willem CUIJPERS, Menno FIEN, Anko Jozef Cornelus SIJBEN, Martin Frans Pierre SMEETS
  • Lithographic apparatus and method
    Patent number: 8416395
    Abstract: A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
    Type: Grant
    Filed: May 6, 2009
    Date of Patent: April 9, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Frits Van der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens
  • Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp
    Patent number: 8098475
    Abstract: An electrostatic clamp for use in a lithographic apparatus includes a layer of material provided with burls, wherein an electrode surrounded by an insulator and or a dielectric material is provided in between the burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: January 17, 2012
    Assignee: ASML Netherlands B.V.
    Inventor: Anko Jozef Cornelus Sijben
  • ELECTROSTATIC CLAMP, LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING AN ELECTROSTATIC CLAMP
    Publication number: 20110170085
    Abstract: An electrostatic clamp for use in a lithographic apparatus includes a layer of material provided with burls, wherein an electrode surrounded by an insulator and or a dielectric material is provided in between the burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.
    Type: Application
    Filed: March 22, 2011
    Publication date: July 14, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Anko Jozef Cornelus SIJBEN
  • Lithographic Projection Apparatus
    Publication number: 20110134399
    Abstract: A lithographic apparatus arranged to transfer a pattern onto a substrate is disclosed. The lithographic apparatus comprises a power supply and an electrical connector. The electrical connector electrically connects the power supply to another component of the lithographic apparatus. The electrical connector comprises a laminate that comprises, in order, a first conducting layer, a first flexible insulating layer, a conductor configured to carry an electrical current, a second flexible insulating layer and a second conducting layer.
    Type: Application
    Filed: June 11, 2010
    Publication date: June 9, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Wilhelmus Damen, Anko Jozef Cornelus Sijben, Johannes Albert Rozenveld, Jeroen-Frank Dekkers, Eugene Maria Brinkhof, Hermannus Antonius Langeler, Petrus Albertus Johannes Francisca Van Gompel
  • Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp
    Patent number: 7940511
    Abstract: An electrostatic clamp for use in a lithographic apparatus includes a layer of material provided with burls, wherein an electrode surrounded by an insulator and or a dielectric material is provided in between the burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.
    Type: Grant
    Filed: September 21, 2007
    Date of Patent: May 10, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Anko Jozef Cornelus Sijben
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20090279061
    Abstract: A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
    Type: Application
    Filed: May 6, 2009
    Publication date: November 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Henricus Wilhelmus JACOBS, Martinus Hendrikus Antonius Leenders, Frits Van Der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens
  • Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp
    Publication number: 20090079525
    Abstract: An electrostatic clamp for use in a lithographic apparatus includes a layer of material provided with burls, wherein an electrode surrounded by an insulator and or a dielectric material is provided in between the burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.
    Type: Application
    Filed: September 21, 2007
    Publication date: March 26, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Anko Jozef Cornelus Sijben