Patents by Inventor Ann-Marie Meyers

Ann-Marie Meyers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100159698
    Abstract: A combination, composition and associated method for chemical mechanical planarization of a tungsten-containing substrate are described herein which afford tunability of tungsten/dielectric selectivity and low selectivity for tungsten removal in relation to dielectric material. Removal rates for both tungsten and dielectric are high and stability of the slurry (e.g., with respect to pH drift over time) is high.
    Type: Application
    Filed: December 3, 2009
    Publication date: June 24, 2010
    Applicant: DuPoint Air Products Nanomaterials LLC
    Inventors: Rachel Dianne McConnell, Ann Marie Meyers
  • Publication number: 20090061630
    Abstract: A method using an associated composition for chemical mechanical planarization of a metal-containing substrate (e.g., a copper substrate) is described. This method affords low dishing and local erosion levels on the metal during CMP processing of the metal-containing substrate.
    Type: Application
    Filed: August 21, 2008
    Publication date: March 5, 2009
    Applicant: DuPont Air Products Nanomaterials LLC
    Inventors: Bentley J. Palmer, Ann Marie Meyers, Suresh Shrauti, Guangying Zhang, Ajoy Zutshi
  • Publication number: 20080149591
    Abstract: A composition and associated method for the chemical mechanical planarization (CMP) of tungsten-containing substrates on semiconductor wafers are described. The composition contains an anionic fluorosurfactant, a per-type oxidizer (e.g., hydrogen peroxide), and iron. The composition and associated method are effective in affording greatly reduced levels of tungsten etching during tungsten CMP. In some embodiments, certain aspartic acid compounds are also present in the composition and are effective in affording even lower levels of tungsten etching during tungsten CMP.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 26, 2008
    Inventors: Junaid Ahmed Siddiqui, Rachel Dianne McConnell, Ann Marie Meyers
  • Publication number: 20080120549
    Abstract: According to a method of the invention, a user can simultaneously display the text and drawings of a document containing a numbered description such as a patent. A computer-implemented system finds a reference number selected by the user/reader in the drawings and displays it in the graphic display, so that the user does not have to hunt for it.
    Type: Application
    Filed: November 21, 2006
    Publication date: May 22, 2008
    Inventors: Ann-Marie Meyers, Philip G. Meyers
  • Publication number: 20070196432
    Abstract: This invention relates to antimicrobial lenses containing coated zeolites and methods for their production.
    Type: Application
    Filed: October 2, 2006
    Publication date: August 23, 2007
    Inventors: David Turner, Azaam Alli, James Ford, Stephen Galas, Ann-Marie Meyers, Frank Neely, James Petisce, Robert Steffen, Douglas Vanderlaan, James Jen, Joseph Hepting, James Ebel
  • Publication number: 20070010595
    Abstract: This invention relates to comfortable ophthalmic devices and methods of producing such devices.
    Type: Application
    Filed: February 10, 2006
    Publication date: January 11, 2007
    Inventors: Kevin McCabe, Robert Steffen, Helene Aguilar, W. Martin, Susan Neadle, Ann-Marie Meyers, Douglas Vanderlaan, Dominic Gourd, Kristy Canavan, Gregory Hill
  • Publication number: 20060159723
    Abstract: This invention relates to antimicrobial lenses containing coated zeolites and methods for their production.
    Type: Application
    Filed: December 1, 2005
    Publication date: July 20, 2006
    Inventors: David Turner, Azaam Alli, James Ford, Stephen Galas, Ann-Marie Meyers, Frank Neely, James Petisce, Robert Steffen, Douglas Vanderlaan, James Jen, Joseph Hepting, James Ebel