Abstract: An avalanche photodiode includes a cathode region and an anode region. A lateral insulating region including a barrier region and an insulating region surrounds the anode region. The cathode region forms a planar optical guide within a core of the cathode region, the guide being configured to guide photons generated during avalanche. The barrier region has a thickness extending through the planar optical guide to surround the core and prevent propagation of the photons beyond the barrier region. The core forms an electrical-confinement region for minority carriers generated within the core.

Abstract: An avalanche photodiode includes a cathode region and an anode region. A lateral insulating region including a barrier region and an insulating region surrounds the anode region. The cathode region forms a planar optical guide within a core of the cathode region, the guide being configured to guide photons generated during avalanche. The barrier region has a thickness extending through the planar optical guide to surround the core and prevent propagation of the photons beyond the barrier region. The core forms an electrical-confinement region for minority carriers generated within the core.

Abstract: An avalanche photodiode includes a cathode region and an anode region. A lateral insulating region including a barrier region and an insulating region surrounds the anode region. The cathode region forms a planar optical guide within a core of the cathode region, the guide being configured to guide photons generated during avalanche. The barrier region has a thickness extending through the planar optical guide to surround the core and prevent propagation of the photons beyond the barrier region. The core forms an electrical-confinement region for minority carriers generated within the core.

Abstract: A device having an FET structure for the emission of an optical radiation integrated on a substrate of a semiconductor material, includes a first mirror, a second mirror of a dielectric type and an active layer comprising a main zone designed to be excited to generate the radiation. The device also includes a first electrically conductive layer containing two doped regions constitutes a source well and a drain well between which a current flows, a second electrically conductive layer which constitutes a gate, and a dielectric region between the first and second layer, to space corresponding peripheral portions of the first and second layers so that the current is channeled in the main zone for generating excitation radiation. The first and second electrically conductive layers and the active layer define an optical cavity.

Abstract: An avalanche photodiode includes a cathode region and an anode region. A lateral insulating region including a barrier region and an insulating region surrounds the anode region. The cathode region forms a planar optical guide within a core of the cathode region, the guide being configured to guide photons generated during avalanche. The barrier region has a thickness extending through the planar optical guide to surround the core and prevent propagation of the photons beyond the barrier region. The core forms an electrical-confinement region for minority carriers generated within the core.

Abstract: An electrically pumped lateral emission electroluminescent device may include a slotted waveguide including a top silicon layer having a thickness between 150 nm and 300 nm and a refraction index associated therewith, and a bottom silicon layer having a thickness between 150 nm and 300 nm and a refraction index associated therewith. A core layer may include silicon oxide between the top and bottom layers and a thickness less than 70 nm. A core layer refraction index may be greater than each of the top and bottom layer refraction indices. A core layer portion may be in a direction of light propagation and may be doped with erbium, and may include silicon nanocrystals. A portion of each of the top and bottom layers may coincide with the core layer portion and may be doped so that the top and bottom layer portions are electrically conductive to define top and bottom plates.

Abstract: An embodiment relates to a sensor being integrated on a semiconductor substrate and comprising at least a vertical double-junction photodiode, in turn comprising at least one first and one second p-n junction formed in said semiconductor substrate, as well as at least an anti-reflection coating formed on said photodiode. Said at least one anti-reflection coating comprises at least one first and one second different anti-reflection layer being suitable to obtain a responsivity peak in correspondence with a predetermined wavelength of an incident optical signal on said sensor. An embodiment also relates to an integration process of such a sensor, as well as to an ambient light sensor made by means of such a sensor.

Abstract: An electrically pumped lateral emission electroluminescent device may include a slotted waveguide including a top silicon layer having a thickness between 150 nm and 300 nm and a refraction index associated therewith, and a bottom silicon layer having a thickness between 150 nm and 300 nm and a refraction index associated therewith. A core layer may include silicon oxide between the top and bottom layers and a thickness less than 70 nm. A core layer refraction index may be greater than each of the top and bottom layer refraction indices. A core layer portion may be in a direction of light propagation and may be doped with erbium, and may include silicon nanocrystals. A portion of each of the top and bottom layers may coincide with the core layer portion and may be doped so that the top and bottom layer portions are electrically conductive to define top and bottom plates.

Abstract: A device for emitting optical radiation is integrated on a substrate of semiconductor material. The device includes an active layer having a main area for generating radiation, and first and second electro-conductive layers having an electric signal that generates an electric field to which an exciting current is associated. In the device, a dielectric region is formed between the first and second layers to space peripheral portions of the first and second layers so that the electric field in the main area is higher than the electric field between the peripheral portions, thereby facilitating generation of the exciting current in the main area. A method of manufacturing is also disclosed.

Abstract: An embodiment relates to a sensor being integrated on a semiconductor substrate and comprising at least a vertical double-junction photodiode, in turn comprising at least one first and one second p-n junction formed in said semiconductor substrate, as well as at least an anti-reflection coating formed on said photodiode. Said at least one anti-reflection coating comprises at least one first and one second different anti-reflection layer being suitable to obtain a responsivity peak in correspondence with a predetermined wavelength of an incident optical signal on said sensor. An embodiment also relates to an integration process of such a sensor, as well as to an ambient light sensor made by means of such a sensor.

Abstract: A method of manufacturing a device for emission of optical radiation integrated on a substrate of a semiconductor material includes the steps of forming a first mirror, a second mirror of a dielectric type, and an active layer comprising a main zone designed to be excited to generate the radiation. First and second electrically conductive layers are formed and arranged to produce a generation electric signal of an electric field to which an excitation current of the main zone is associated. A dielectric region is formed between the first and the second layers by partially oxidizing the first electrically conductive layer to and thereby obtaining a thermal oxide layer, to space out corresponding peripheral portions of the first and second layers so that the electric field present in the main zone is greater than that present between the peripheral portions thus favouring a corresponding generation of the excitation current in the main zone.

Abstract: A device having an FET structure for the emission of an optical radiation integrated on a substrate of a semiconductor material, includes a first mirror, a second mirror of a dielectric type and an active layer comprising a main zone designed to be excited to generate the radiation. The device also includes a first electrically conductive layer containing two doped regions constitutes a source well and a drain well between which a current flows, a second electrically conductive layer which constitutes a gate, and a dielectric region between the first and second layer, to space corresponding peripheral portions of the first and second layers so that the current is channelled in the main zone for generating excitation radiation. The first and second electrically conductive layers and the active layer define an optical cavity.

Abstract: A device for emitting optical radiation is integrated on a substrate of semiconductor material. The device includes an active layer having a main area for generating radiation, and first and second electro-conductive layers having an electric signal that generates an electric field to which an exciting current is associated. In the device, a dielectric region is formed between the first and second layers to space peripheral portions of the first and second layers so that the electric field in the main area is higher than the electric field between the peripheral portions, thereby facilitating generation of the exciting current in the main area. A method of manufacturing is also disclosed.