Abstract: There is provided a method and system for filling micromechanical structures with x-ray absorbing material. The method includes providing a wetting layer for enabling melted x-ray absorbing material to flow over the surface of an overall structure including the micromechanical structures, melting the x-ray absorbing material, and applying gas pressure to press the melted x-ray absorbing material into the micromechanical structures.

Abstract: Disclosed is a method for melting and solidification of a scintillating material in micromechanical structures, including controlling the melting and solidification of the scintillating material by individually controlled heat sources, a top heater and a bottom heater, placed above and below a process chamber, housing a sample with the micromechanical structures and the scintillating material. The heaters are controlled to set a vertical temperature gradient over the sample to control the melting and solidification of the scintillating material. During melting, the top heater is ramped up and stabilized at a temperature where no melting occurs and the bottom heater is ramped up and stabilized at a temperature where melting occurs during a period of time while the scintillating material melts and flows into the micromechanical structures. During solidification, the temperature of the bottom heater decreases to enable solidification to take place starting from the bottom of the micromechanical structures.

Abstract: There is provided a method and system for filling micromechanical structures with x-ray absorbing material. The method includes providing a wetting layer for enabling melted x-ray absorbing material to flow over the surface of an overall structure including the micromechanical structures, melting the x-ray absorbing material, and applying gas pressure to press the melted x-ray absorbing material into the micromechanical structures.

Abstract: Disclosed is a method for manufacturing a scintillator according to the proposed technology. The method includes providing a basic scintillator structure having micromechanical features, the basic scintillator structure having a front and a back. The method also includes applying a reflector on the front of the basic scintillator structure, and opening the back of the basic scintillator structure to create a scintillator having open ended micromechanical features.

Abstract: Disclosed is a method for manufacturing a scintillator according to the proposed technology. The method includes providing a basic scintillator structure having micromechanical features, the basic scintillator structure having a front and a back. The method also includes applying a reflector on the front of the basic scintillator structure, and opening the back of the basic scintillator structure to create a scintillator having open ended micromechanical features.

Abstract: Disclosed is a method for melting and solidification of a scintillating material in micromechanical structures, including controlling the melting and solidification of the scintillating material by individually controlled heat sources, a top heater and a bottom heater, placed above and below a process chamber, housing a sample with the micromechanical structures and the scintillating material. The heaters are controlled to set a vertical temperature gradient over the sample to control the melting and solidification of the scintillating material. During melting, the top heater is ramped up and stabilized at a temperature where no melting occurs and the bottom heater is ramped up and stabilized at a temperature where melting occurs during a period of time while the scintillating material melts and flows into the micromechanical structures. During solidification, the temperature of the bottom heater decreases to enable solidification to take place starting from the bottom of the micromechanical structures.

Abstract: There is provided a thin film reflector, a method and an ALD-system for producing the thin film reflector. The method includes the steps of providing a substrate including at least one type of material, and providing a thin film including a metallic compound on at least part of the substrate. The method also includes the step of coating at least part of the thin film with a first barrier layer by applying Low Temperature Atomic Layer Deposition with at least one first material, and the step of providing a second barrier layer on at least part of the first barrier layer by applying High Temperature Atomic Layer Deposition, with at least one second material to thereby obtain a multi-layered thin film reflector. There is also an ALD control system for controlling the ALD-system. There is furthermore provided a computer program for controlling the temperature to be used by an ALD-tool.

Abstract: There is provided an x-ray scintillator (10) including a pore matrix having a plurality of pores formed in a substrate (1). Each of the pores is at least partially covered with a multi-layered coating including at least a reflective layer (2) and a protective layer (3). The at least partially coated pores are filled with scintillating material (4) for absorbing x-ray photons to produce secondary photons, preferably with a wavelength in the visible range. The reflective layer (2) of the multi-layered coating is arranged between the scintillating material (4) and the substrate (1) for reflecting the secondary photons, and the protective layer (3) of the multi-layered coating is arranged between the reflective layer (2) and the scintillating material (4) for protecting the reflective layer while allowing reflection of the secondary photons by the reflective layer.

Abstract: There is provided an x-ray scintillator (10) including a pore matrix having a plurality of pores formed in a substrate (1). Each of the pores is at least partially covered with a multi-layered coating including at least a reflective layer (2) and a protective layer (3). The at least partially coated pores are filled with scintillating material (4) for absorbing x-ray photons to produce secondary photons, preferably with a wavelength in the visible range. The reflective layer (2) of the multi-layered coating is arranged between the scintillating material (4) and the substrate (1) for reflecting the secondary photons, and the protective layer (3) of the multi-layered coating is arranged between the reflective layer (2) and the scintillating material (4) for protecting the reflective layer while allowing reflection of the secondary photons by the reflective layer.