Abstract: A photonic crystal guided propagation structure. The structure includes a guide portion Wn, n being a positive real number or zero number, having a first configuration of rows of patterns, and a guide portion Wm, m being a real number, m>n, having a second configuration of rows of patterns, and a transition zone of distance D located between guide portion Wn and guide portion Wm, in which patterns aligned with at least one row of patterns in the first configuration decrease in size over distance D to allow progressive passing from the first configuration of rows of patterns to the second configuration of rows of patterns. The structures can be applied to the area of integrated optics (semiconductor lasers, laser modulators, filters, multiplexors, etc.).