Patents by Inventor Anne Mooring

Anne Mooring has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions
    Patent number: 5182185
    Abstract: Photosensitizers containing saturated and unsaturated polycyclic compounds containing the cyclopentane-2-diazo-1,3-dione structural unit.These compounds have their maximum u.v. absorption at around 248 nm, decompose into polar products upon irradiation, and can be used as photosensitizers in positive deep u.v. or excimer laser (248 nm) lithography. They are most preferably useful with deep u.v. transparent resins for forming photoresists.
    Type: Grant
    Filed: April 30, 1991
    Date of Patent: January 26, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Chengjiu Wu, Anne Mooring, James T. Yardley
  • Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione
    Patent number: 5039596
    Abstract: Photosensitizers containing saturated and unsaturated polycyclic compounds containing the cyclopentane-2-diazo-1,3-dione structural unit.These compounds have their maximum u.v. absorption at around 248 nm, decompose into polar products upon irradiation, and can be used as photosensitizers in positive deep u.v. or excimer laser (248 nm) lithography. They are most preferably useful with deep u.v. transparent resins for forming photoresists.
    Type: Grant
    Filed: June 29, 1989
    Date of Patent: August 13, 1991
    Assignee: Hoechst Celanese Corporation
    Inventors: Chengjiu Wu, Anne Mooring, James T. Yardley