Patents by Inventor Anne Sakdinawat

Anne Sakdinawat has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112913
    Abstract: A mask apparatus for x-ray lithography and metrology where the x-ray absorber material is embedded in diamond and then covered with a thermally conductive material to provide requisite thermal conductivity when irradiated with x-rays. The apparatus then includes a hollow holder that is thermally interfaced with the mask and may also include means for external thermal control. The mask apparatus allows for transmission of x-rays from a lithography beam as well as metrology beams of other wavelengths including UV, IR, visible, and others.
    Type: Application
    Filed: October 3, 2023
    Publication date: April 4, 2024
    Inventors: Anne Sakdinawat, Yanwei Liu