Abstract: The compositions and methods that can be used in desiccants in manufactured units requiring an enclosed atmosphere with minimal water and volatile content. Such materials need to maintain a low concentration of volatile materials in an enclosed space in a unit to avoid any unneeded interference of water or other volatiles in the utility of the unit. In one application, the desiccant material can keep the insulated glass units (IGUs) from fogging, which includes forming water or depositing volatiles on internal surfaces.

Abstract: A method of manufacturing a structure can include forming a buffer layer on a transparent conductive oxide layer, where the buffer layer includes a layer including zinc and tin, and the transparent conductive oxide layer includes a layer including cadmium and tin.

Abstract: A structure includes a barrier layer which can include a silicon aluminum oxide, and a transparent conductive oxide layer which can include a layer of cadmium and tin.

Abstract: A structure including a barrier layer adjacent to a substrate, a transparent conductive oxide layer adjacent to the barrier layer, and a buffer layer adjacent to the transparent conductive oxide layer. In the structure, the barrier layer includes a silicon aluminum oxide, the transparent conductive oxide layer includes cadmium and tin and the buffer layer comprises tin oxide. A photovoltaic device that includes the described structure along with a semiconductor window layer adjacent to the buffer layer and a semiconductor absorber layer adjacent to the semiconductor window layer. Methods of manufacturing a photovoltaic structure are also disclosed, as well as a sputter target for use in the manufacture of a photovoltaic device and methods of manufacturing the same.

Abstract: A multilayered structure including a first barrier layer adjacent to a substrate, a barrier bi-layer adjacent to the first barrier layer, the barrier bi-layer comprising a second barrier layer and a third barrier layer, a transparent conductive oxide layer adjacent to the barrier bi-layer, and a buffer layer adjacent to the transparent conductive oxide layer and method of forming the same. A multilayered substrate including a barrier layer structure having a plurality of barrier layers being alternating layers of low refractive index material and high refractive index material, a transparent conductive oxide layer adjacent to the barrier bi-layer and a buffer layer adjacent to the transparent conductive oxide layer. The multilayered structure may serve as a front contact for photovoltaic devices.

Abstract: The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

Abstract: The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

Abstract: The invention provides a substrate bearing a photocatalytic coating. In some embodiments, the coating includes a photocatalytic film comprising titania deposited over a layer comprising tungsten oxide, aluminum oxide, niobium oxide or zirconium oxide. Additionally or alternatively, the photocatalytic film can include both titania and a material selected from the group consisting of nitrogen, tantalum, copper and silica. The invention also provides methods of depositing such coatings.

Abstract: A substrate bearing a low-emissivity coating, the coating comprising two infrared-reflective layers separated by a middle coat, the middle coat comprising two zinc tin oxide film regions separated by a tin oxide film region.

Abstract: A substrate having a surface carrying a removable transparent film that can be removed by the surface by a desired washing process, and removable presence indicator associated with the removable transparent film, the presence indicator being removable by the same desired washing process as the removable transparent film. A method of producing a substrate having a presence indicator in contact with a removable transparent film a method of washing a substrate having a presence indicator in contact with a removable transparent film are also disclosed.

Abstract: The invention provides temperable high shading performance low-emissivity coatings. The invention also provides insulating glass units, monolithic panes, and other substrates bearing such coatings. Further, the invention provides methods of producing coated substrates by depositing coatings of this nature.

Abstract: The invention provides niobium-titanium films, coatings (e.g., low-emissivity coatings) comprising one or more niobium-titanium films, and substrates bearings such coatings. Methods of depositing niobium-titanium films are also provided.

Abstract: The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

Abstract: The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

Abstract: A glass article that has a water-sheeting coating and methods of applying coating to a substrate are described. In certain embodiments, a water-sheeting coating 20 comprising silica is sputtered directly over a pyrolytic dielectric film over a glass sheet. In some cases, the exterior face of this water-sheeting coating is substantially non-porous but has an irregular surface. The water-sheeting coating causes water applied to the coated surface to sheet, making the glass article easier to clean and helping the glass stay clean longer. One embodiment provides an IG unit having a low-emissivity coating on its #2 surface, and having on its #4 surface a sputtered silica film over a pyrolytic dielectric layer.

Abstract: Compositions, articles, and methods for treating substrate surfaces to impart functional properties to the surface or to restore functional properties to functional coatings borne on such surfaces. Compositions may be provided as abrasive particles dispersed in a liquid medium, a solution or a gel. Articles for treating substrate surfaces, such as a glass surfaces, include fabrics impregnated with such composition and kits comprised of the composition and a fabric which may be impregnated with such compositions. In a method of treating, a substrate having a surface is provided. The surface of the substrate may include a functional coating. The surface is treated by washing, wiping or other application of the composition to the substrate surface or functional coating borne on the surface.

Abstract: The present invention in some embodiments provides sputter deposition techniques for applying thin film and thereafter applying over the sputtered film a temporary protective film. The thin film can optionally be applied by sputtering a target in a gaseous sputtering atmosphere containing an oxidizing gas and/or an inert gas. The invention in some embodiments relates to an insulating glazing unit or a monolithic pane having a thin film coating, deposited for example by sputtering, on at least one major surface, the thin film coating carrying a temporary protective film. The invention also provides embodiments involving high efficiency methods for producing such products.

Abstract: The invention provides a substrate bearing a low-maintenance coating. The coating includes two films: a first film comprising silica (e.g., silicon dioxide) and a second film comprising titania (e.g., titanium dioxide). Preferably, both films are provided within particular thickness ranges. The invention also provides methods of depositing such coatings.

Abstract: The invention provides a substrate bearing a low-maintenance coating. The coating includes at least two films: a base film optionally comprising silica (e.g., silicon dioxide) and a film comprising titania (e.g., titanium dioxide). The invention also provides methods of depositing such coatings.

Abstract: Embodiments of the invention include a LCD having a mirror including a substrate having a first surface and a second surface. The substrate may carry one or more dichroic mirror coatings and the LCD or mirror may be selectively viewable from the first surface side. Embodiments of the invention also include methods of making and using a LCD mirror.