Patents by Inventor Annette Muehlpfordt

Annette Muehlpfordt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080218716
    Abstract: In some embodiments, the disclosure provides a method for setting an optical imaging property in a microlithographic projection exposure apparatus via which a mask can be imaged onto a substrate having a light-sensitive surface, wherein the substrate can be moved stepwise in a direction transversely with respect to an optical axis relative to a projection objective. The method can include introducing an immersion medium under a predetermined pressure and/or with a predetermined flow rate into at least one first interspace, wherein the at least one first interspace—as seen along the optical axis—is arranged within an illumination system and/or the projection objective and/or between the illumination system and the mask and/or the mask and the projection objective and/or the projection objective and the substrate. The method can also include monitoring an actual pressure and/or an actual flow rate of the immersion medium for deviation from the predetermined pressure and/or the predetermined flow rate.
    Type: Application
    Filed: March 7, 2008
    Publication date: September 11, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: Stephan Back, Guido Soyez, Joachim Buechele, Annette Muehlpfordt
  • Patent number: 6796664
    Abstract: A method and a device for decontaminating optical surfaces, in particular for decontaminating the surfaces of beam-guiding optics employing UV-radiation in a cleansing atmosphere. The wavelength of the UV-radiation employed falls within a range where oxygen strongly absorbs and the cleansing atmosphere has an oxygen concentration less than that of air. The method and device have application to, e.g., cleaning the surfaces of the beam-guiding optics of microlithographic projection-exposure systems.
    Type: Grant
    Filed: March 12, 2003
    Date of Patent: September 28, 2004
    Assignee: Carl Zeiss SMT AG
    Inventors: Jens Luedecke, Christoph Zazcek, Alexandra Pazidis, Jens Ullmann, Annette Muehlpfordt, Michael Thier, Stefan Wiesner
  • Publication number: 20030210458
    Abstract: A method and a device for decontaminating optical surfaces, in particular for decontaminating the surfaces of beam-guiding optics employing UV-radiation in a cleansing atmosphere. The wavelength of the UV-radiation employed falls within a range where oxygen strongly absorbs and the cleansing atmosphere has an oxygen concentration less than that of air. The method and device have application to, e.g., cleaning the surfaces of the beam-guiding optics of microlithographic projection-exposure systems.
    Type: Application
    Filed: March 12, 2003
    Publication date: November 13, 2003
    Applicant: CARL ZEISS SMT AG
    Inventors: Jens Luedecke, Christoph Zazcek, Alexandra Pazidis, Jens Ullmann, Annette Muehlpfordt, Michael Thier, Stefan Wiesner