Patents by Inventor Ansley E Dennis

Ansley E Dennis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography
    Patent number: 8263129
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: September 11, 2012
    Assignee: The University of North Carolina at Chapel Hill
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E Dennis, Edward T. Samulski, R. Jude Samulski