Abstract: A coating apparatus having a vacuum chamber, a plurality of cathodes arranged therein and also a HIPIMS power source, characterized in that in addition to at least one coating cathode which can be operated with the HIPIMS power source a plurality of etching cathodes is provided which are smaller in area in comparison to the coating cathode, with the etching cathodes being connectable in a predetermined or predeterminable sequence to the HIPIMS power source.

Abstract: The invention relates to a device for the plasma and/or coating treatment of workpieces comprising a chamber (2) that can be evacuated, a holding device (3) for the workpieces to be treated that is rotatably mounted within the chamber (2) and a plasma source (4). In order to create a device of the above mentioned type that enables the treatment of relatively great workpieces with respect to the size of the device, the invention proposes that the plasma source (4) is placed within the chamber (2), for which purpose the at least one cathode (5) and the least one anode (6) of the plasma source (4) are mounted on the upper side or lower side (7, 8) inside the chamber (2).