Patents by Inventor Anthonie Kuijper

Anthonie Kuijper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Immersion liquid, exposure apparatus, and exposure process
    Patent number: 10712675
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180292762
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Application
    Filed: June 14, 2018
    Publication date: October 11, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf KEMPER, Nicolaas TEN KATE, Joost Jeroen OTTENS, Marcel BECKERS, Marco POLIZZI, Michel RIEPEN, Anthonie KUIJPER, Koen STEFFENS, Adrianes Johannes BAETEN, Anca Mihaela ANTONEVICI
  • Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
    Patent number: 10018925
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: July 10, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
  • IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS
    Publication number: 20180004100
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Application
    Filed: September 18, 2017
    Publication date: January 4, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • Immersion liquid, exposure apparatus, and exposure process
    Patent number: 9772565
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: September 26, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170192365
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Application
    Filed: March 7, 2017
    Publication date: July 6, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf KEMPER, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
  • Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
    Patent number: 9606429
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: March 28, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
  • Immersion liquid, exposure apparatus, and exposure process
    Patent number: 9454088
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: October 16, 2015
    Date of Patent: September 27, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS
    Publication number: 20160033876
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Application
    Filed: October 16, 2015
    Publication date: February 4, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans JANSEN, Marco Koert STAVENGA, Jacobus Johannus Leonardus Hendricus VERSPAY, Franciscus Johannes Joseph JANSSEN, Anthonie KUIJPER
  • Immersion liquid, exposure apparatus, and exposure process
    Patent number: 9164391
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: October 1, 2014
    Date of Patent: October 20, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • Lithographic apparatus and device manufacturing method
    Patent number: 8988657
    Abstract: A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.
    Type: Grant
    Filed: July 3, 2012
    Date of Patent: March 24, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Johannes Jacobus Van Boxtel, Jeroen Gerard Gosen, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Jean-Philippe Xavier Van Damme, Peter Schoenmakers, Franciscus Joannes Anthonius Evers, Jaap Wilhelmus Petrus Van Empel, Léon Hubert Joseph Coumans, Justin Johannes Hermanus Gerritzen
  • IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS
    Publication number: 20150056559
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Application
    Filed: October 1, 2014
    Publication date: February 26, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans JANSEN, Marco Koert STAVENGA, Jacobus Johannus Leonardus Hendricus VERSPAY, Franciscus Johannes Joseph JANSSEN, Anthonie KUIJPER
  • Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
    Patent number: 8953142
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: February 10, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
  • LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150015857
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 15, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf KEMPER, Nicolaas TEN KATE, Joost Jeroen OTTENS, Marcel BECKERS, Marco POLIZZI, Michel RlEPEN, Anthonie KUIJPER, Koen STEFFENS, Adrianes Johannes BAETEN, Anca Mihaela ANTONEVICI
  • Immersion liquid, exposure apparatus, and exposure process
    Patent number: 8859188
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: February 6, 2006
    Date of Patent: October 14, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 8564757
    Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: October 22, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Bauke Jansen, Richard Joseph Bruls, Hans Jansen, Antonius Johannus Van der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Eric Willem Felix Casimiri
  • Lithographic apparatus and a method of measuring flow rate in a two phase flow
    Patent number: 8446561
    Abstract: A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: May 21, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Jacob Kramer, Antonius Johannus Van Der Net, Erik Henricus Egidius Catharina Eummelen, Anthonie Kuijper
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 8432531
    Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: April 30, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Kornelis Tijmen Hoekerd, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20130010270
    Abstract: A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.
    Type: Application
    Filed: July 3, 2012
    Publication date: January 10, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Frank Johannes Jacobus VAN BOXTEL, Jeroen Gerard Gosen, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Jean-Philippe Xavier Van Damme, Peter Schoenmakers, Franciscus Joannes Anthonius Evers, Jaap Wilhelmus Petrus Van Empel, Léon Hubert Joseph Coumans, Justin Johannes Hermanus Gerritzen
  • FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120069309
    Abstract: A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a fluid supply opening radially outward of the meniscus pinning feature to supply a fluid soluble in the immersion fluid which on dissolution into the immersion fluid lowers the surface tension of the immersion fluid.
    Type: Application
    Filed: August 22, 2011
    Publication date: March 22, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul WILLEMS, Nicolaas Ten Kate, Stephan Koelink, Pieter Jacob Kramer, Anthonie Kuijper, Alexander Nikolov Zdravkov, Rogier Hendrikus Magdalena Cortie